Publications by Philippe Flückiger

Related publications (8)

A novel CMOS SOI unbalanced Mach-Zehnder interferometer: from design and simulations to fabrication and characterization

Luc Thévenaz, Mihai Adrian Ionescu, Philippe Renaud, Michel Declercq, Philippe Robert, Cyrille Hibert, Georges-André Racine, Philippe Flückiger

This paper reports on a novel, simple yet reliable, unbalanced SOI Mach-Zehnder (M-Z) interferometer architecture based on 1.2 μm CMOS process and adapted post-processing for the waveguide sidewalls. The fabricated electro-optical device is based on multip ...

2001

High tuning range AlSi RF MEMS capacitors fabricated with sacrificial amorphous silicon surface micromachining

Mihai Adrian Ionescu, Philippe Renaud, Catherine Dehollain, Michel Declercq, Cyrille Hibert, Philippe Flückiger, Raphaël Fritschi

This paper reports the fabrication and electrical characterization of high tuning range AlSi RF MEMS capacitors. We present experimental results obtained by a surface micromachining process that uses dry etching of sacrificial amorphous silicon to release ...

2004

Bow-tie optical antenna probes for single-emitter scanning near-field optical microscopy

Philippe Flückiger

A method for the fabrication of bow-tie optical antennas at the apex of pyramidal Si3N4 atomic force microscopy tips is described. We demonstrate that these novel optical probes are capable of sub-wavelength imaging of single quantum dots at room temperatu ...

2007

Fabrication of vertical digital silicon optical micromirrors on suspended electrode for guided-wave optical switching applications

Philippe Renaud, Cyrille Hibert, Philippe Flückiger, Roland Guerre

This paper presents a novel technological and design study of optical guided- wave MicroElectroMechanical Systems (MEMS) switch. We work on a concept of hermetic assembly in which a MEMS wafer is covered (top-down) by a crossing optical waveguide wafer. Th ...

2005

Profile angle control in SIO2 deep anisotropic dry etching for MEMS fabrication

Philippe Renaud, Cyrille Hibert, Philippe Flückiger

We report a recent breakthrough to control profile angle for SiO2 Deep Anisotropic Dry Etching (SDADE). Our study reveals that gas residence time is the key parameter to control profile angle. Moreover, we show that it is possible to control profile angle, ...

2004

RF MEMS switches for mobile communications : from metal-metal to suspended-gate MOS device architectures

Mihai Adrian Ionescu, Vincent Pott, Cyrille Hibert, Philippe Flückiger, Nicolas Abelé, Raphaël Fritschi

2005

Fabrication process and model for a MEMS parallel-plate capacitor above CPW line

Mihai Adrian Ionescu, Anja Skrivervik, Jean-François Zürcher, Julien Perruisseau-Carrier, Cyrille Hibert, Pedro Crespo Valero, Philippe Flückiger, Raphaël Fritschi

2004

3-D integrable optoelectronic devices for telecommunications ICs

Luc Thévenaz, Mihai Adrian Ionescu, Philippe Renaud, Philippe Robert, Michel Declercq, Cyrille Hibert, Georges-André Racine, Philippe Flückiger

The design, fabrication and characterization of CMOS-compatible optoelectronic devices is discussed. All devices are fabricated on silicon on insulator (SOI) substrates which makes them suitable for three-dimensional (3-D) telecommunication photonic integr ...

2002