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Andreea Veronica Savu

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Publications associées (56)

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Streched organic transistors maintain mobility on flexible substrates

Mihai Adrian Ionescu, Jürgen Brugger, Andreea Veronica Savu, Katrin Sidler Arnet, Nenad Cvetkovic

Two levels of aligned stencil lithography were used to fabricate pentacene thin film transistors on 12 mu m thick flexible polyimide substrates. Flexible transistors with 20 x 40 mu m(2) channels were electrically measured under strain up to 2.6%. After on ...

Elsevier2012

Heated membranes prevent clogging of apertures in nanostencil lithography

Jürgen Brugger, Andreea Veronica Savu, Shenqi Xie

We demonstrate a novel concept for nanostencil lithography with an integrated microhotplate on the stencil membrane aimed at eliminating or reducing aperture clogging during metal deposition. The stencil can be locally heated up by the embedded Pt coils to ...

2011

Solid-state Nanopore Array Membranes Patterned by Electron Beam Lithography, Nanosphere Lithography and Aluminum Anodization

Jürgen Brugger, Songmei Wu, Andreea Veronica Savu, Oscar Vazquez Mena, Vaida Auzelyte

We present the fabrication of thin membranes with dense arrays of nanometer and submicrometer pore arrays by the integration of standard micromachining with three pore patterning techniques: electron beam lithography (EBL), nanosphere lithography (NSL) and ...

Research Publishing Services2011

The effects of channel length and film microstructure on the performance of pentacene transistors

Jürgen Brugger, Andreea Veronica Savu, Libero Zuppiroli, Katrin Sidler Arnet, Michel Schär, Franziska Dora Fleischli

With the use of the stencil lithography, we fabricated pentacene thin-ﬁlm transistors pre- pared directly on thermally oxidized silicon gates with channel lengths ranging from 2 to 600 lm. By performing 4-probe measurements or by using the transfer line me ...

Elsevier2011

Mechanical stabilisation and design optimisation of masks for stencil lithography: Numerical approach and experimental validation

Jürgen Brugger, Andreea Veronica Savu, Marc Antonius Friedrich van den Boogaart

This paper addresses mask deformation phenomenon that frequently occurs but is highly undesirable in stencil lithography. Previously, a technique for mechanical stabilisation of stencils was proposed [M.A.F. van den Boogaart, et al., Corrugated membranes f ...

2008

Solid-state nanopore array membranes patterned by electron beam lithography, nanosphere lithography and aluminum anodization

Jürgen Brugger, Andreea Veronica Savu, Oscar Vazquez Mena, Songmei Wu, Vaida Auzelyte

2011

Ambipolar silicon nanowire FETs with stenciled sub-µm metal gate

Giovanni De Micheli, Yusuf Leblebici, Jürgen Brugger, Andreea Veronica Savu, Davide Sacchetto

A fully CMOS compatible fabrication flow using low temperature a-Si LPCVD and stencil lithography has been developed and proved suitable for SiNW FinFETs having ambipolar conductance. The stencil mask has been demonstrated to be a real option for sub-micro ...

2010

Grazing angle X-ray fluorescence from periodic structures on silicon and silica surfaces

Andreea Veronica Savu

Various 3-dimensional nano-scaled periodic structures with different configurations and periods deposited on the surface of silicon and silica substrates were investigated by means of the grazing incidence and grazing emission X-ray fluorescence techniques ...

Pergamon-Elsevier Science Ltd2014

Stencilled Conducting Bismuth Nanowires

Jürgen Brugger, Luis Guillermo Villanueva Torrijo, Andreea Veronica Savu, Oscar Vazquez Mena, Katrin Sidler Arnet, Sam Neuser

2009

Nanoporous SiN membranes patterned by wafer-scale nanosphere lithography

Jürgen Brugger, Andreea Veronica Savu, Oscar Vazquez Mena

Nanoporous SiN membranes are interesting for a number of applications, e.g. stenciling, filtration, or tissue engineering [1-3]. The patterning of the pores requires a high resolution lithographic tool. Focused ion beam milling or e-beam lithography fulfil ...

2010

Application of stencil masks for ion beam lithographic patterning

Jürgen Brugger, Andreea Veronica Savu

The application of Au/Si3N4 stencil masks for the transfer of patterns using different MeV-ion beams with various substrates has been investigated. The techniques investigated were namely, conventional lithography with positive- and negative-tone resist po ...

Elsevier2013

Resistless Fabrication of Nanoimprint Lithography (NIL) Stamps Using Nano-Stencil Lithography

Jürgen Brugger, Luis Guillermo Villanueva Torrijo, Andreea Veronica Savu, Oscar Vazquez Mena, Katrin Sidler Arnet, Cristina Martin Olmos

In order to keep up with the advances in nano-fabrication, alternative, cost-efficient lithography techniques need to be implemented. Two of the most promising are nanoimprint lithography (NIL) and stencil lithography. We explore here the possibility of fa ...

MDPI2013

Quick and Clean: Stencil Lithography for Wafer-Scale Fabrication of Superconducting Tunnel Junctions

Jürgen Brugger, Andreea Veronica Savu

This paper presents a resist-less process for parallel fabrication of sub-micrometer Al-AlOx-Al superconducting tunnel junctions. A custom stencil is fabricated containing 200 nm low stress SiN membranes with micro-apertures. The stencil is aligned and cla ...

IEEE Institute of Electrical and Electronics Engineers2009

Heated mask

Jürgen Brugger, Andreea Veronica Savu, Shenqi Xie

The invention concerns a method and a device wherein a stencil is provided with an integrated microhotplate on the stencil membrane to prevent aperture clogging, whereby the stencil can be locally heated up in order to minimize material condensation, remov ...

2013

Etching of sub-micrometer structures through Stencil

Jürgen Brugger, Luis Guillermo Villanueva Torrijo, Andreea Veronica Savu, Oscar Vazquez Mena, Marc Antonius Friedrich van den Boogaart, Katrin Sidler Arnet, Kristopher Pataky

Resistless processes to realize the pattern transfer of your designs into the substrate present some advantages, as the reduction in fabrication steps. Stencil Lithography (SL) is one of the most used resistless processes and, up to now, it has mainly been ...

2008

Sputtering of (001)AlN thin films: Control of polarity by a seed layer

Jürgen Brugger, Nicolas Grandjean, Paul Muralt, Jean-François Carlin, Denis Martin, Andreea Veronica Savu, Scott Harada, Evgeny Milyutin

The authors report on the ability to control the polarity of sputter deposited AlN001 thin ﬁlms using seed layers. Reactive sputter deposition leads to N-polarity on any substrate hitherto applied, i.e., Si111, sapphire, SiO2, and polycrystalline metals su ...

American Vacuum Society2010

Organic Thin Film Transistors on Flexible Polyimide Substrates Fabricated by Full Wafer Stencil Lithography

Mihai Adrian Ionescu, Jürgen Brugger, Andreea Veronica Savu, Katrin Sidler Arnet, Nenad Cvetkovic

This paper presents new results on miniaturized organic thin film transistors (TFT) fabricated on a spin coated polyimide (PI) film. Patterning steps, that are vital for the integrity and electrical performances of the organic TFT, were performed using res ...

Elsevier Science, Reg Sales Off, Customer Support Dept, 655 Ave Of The Americas, New York, Ny 10010 Usa2009

Reusability of nanostencils for the patterning of Aluminum nanostructures by selective wet etching

Jürgen Brugger, Luis Guillermo Villanueva Torrijo, Andreea Veronica Savu, Oscar Vazquez Mena, Marc Antonius Friedrich van den Boogaart

One of the major advantages of stencil lithography is the possibility to use stencils many times. However, when stencils contain nanoapertures, the clogging of the membranes limits the useful life time of the stencils. The clogging is due to the accumulati ...

Elsevier2008

Dynamic stencil lithography on full wafer scale

Jürgen Brugger, Andreea Veronica Savu, Marc Antonius Friedrich van den Boogaart

In this paper, the authors present a breakthrough extension of the stencil lithography tool and method. In the standard stencil lithography static mode, material is deposited through apertures in a membrane (stencil) on a substrate which is clamped to the ...

2008

KFM detection of quantified charges injected into a thin SiO2 layer containing Si nps embedded by ultra low energy ion implantation using stencil lithography

Jürgen Brugger, Andreea Veronica Savu, Marc Antonius Friedrich van den Boogaart

2008