Andreea Veronica Savu

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Two levels of aligned stencil lithography were used to fabricate pentacene thin film transistors on 12 mu m thick flexible polyimide substrates. Flexible transistors with 20 x 40 mu m(2) channels were electrically measured under strain up to 2.6%. After on ...

We demonstrate a novel concept for nanostencil lithography with an integrated microhotplate on the stencil membrane aimed at eliminating or reducing aperture clogging during metal deposition. The stencil can be locally heated up by the embedded Pt coils to ...

We present the fabrication of thin membranes with dense arrays of nanometer and submicrometer pore arrays by the integration of standard micromachining with three pore patterning techniques: electron beam lithography (EBL), nanosphere lithography (NSL) and ...

With the use of the stencil lithography, we fabricated pentacene thin-ﬁlm transistors pre- pared directly on thermally oxidized silicon gates with channel lengths ranging from 2 to 600 lm. By performing 4-probe measurements or by using the transfer line me ...

This paper addresses mask deformation phenomenon that frequently occurs but is highly undesirable in stencil lithography. Previously, a technique for mechanical stabilisation of stencils was proposed [M.A.F. van den Boogaart, et al., Corrugated membranes f ...

A fully CMOS compatible fabrication flow using low temperature a-Si LPCVD and stencil lithography has been developed and proved suitable for SiNW FinFETs having ambipolar conductance. The stencil mask has been demonstrated to be a real option for sub-micro ...

Various 3-dimensional nano-scaled periodic structures with different configurations and periods deposited on the surface of silicon and silica substrates were investigated by means of the grazing incidence and grazing emission X-ray fluorescence techniques ...

Nanoporous SiN membranes are interesting for a number of applications, e.g. stenciling, filtration, or tissue engineering [1-3]. The patterning of the pores requires a high resolution lithographic tool. Focused ion beam milling or e-beam lithography fulfil ...

The application of Au/Si3N4 stencil masks for the transfer of patterns using different MeV-ion beams with various substrates has been investigated. The techniques investigated were namely, conventional lithography with positive- and negative-tone resist po ...

In order to keep up with the advances in nano-fabrication, alternative, cost-efficient lithography techniques need to be implemented. Two of the most promising are nanoimprint lithography (NIL) and stencil lithography. We explore here the possibility of fa ...

This paper presents a resist-less process for parallel fabrication of sub-micrometer Al-AlOx-Al superconducting tunnel junctions. A custom stencil is fabricated containing 200 nm low stress SiN membranes with micro-apertures. The stencil is aligned and cla ...

Resistless processes to realize the pattern transfer of your designs into the substrate present some advantages, as the reduction in fabrication steps. Stencil Lithography (SL) is one of the most used resistless processes and, up to now, it has mainly been ...

The authors report on the ability to control the polarity of sputter deposited AlN001 thin ﬁlms using seed layers. Reactive sputter deposition leads to N-polarity on any substrate hitherto applied, i.e., Si111, sapphire, SiO2, and polycrystalline metals su ...

This paper presents new results on miniaturized organic thin film transistors (TFT) fabricated on a spin coated polyimide (PI) film. Patterning steps, that are vital for the integrity and electrical performances of the organic TFT, were performed using res ...

One of the major advantages of stencil lithography is the possibility to use stencils many times. However, when stencils contain nanoapertures, the clogging of the membranes limits the useful life time of the stencils. The clogging is due to the accumulati ...

In this paper, the authors present a breakthrough extension of the stencil lithography tool and method. In the standard stencil lithography static mode, material is deposited through apertures in a membrane (stencil) on a substrate which is clamped to the ...

Dynamic stencil lithography uses a moving shadow-mask to draw patterns by having directionally evaporated material deposited through the stencil apertures onto the substrate. Sub-micrometre, two- dimensional patterning is demonstrated at full 100 mm wafer ...

Andreea Veronica Savu

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Streched organic transistors maintain mobility on flexible substrates

Heated membranes prevent clogging of apertures in nanostencil lithography

Solid-state Nanopore Array Membranes Patterned by Electron Beam Lithography, Nanosphere Lithography and Aluminum Anodization

The effects of channel length and film microstructure on the performance of pentacene transistors

Mechanical stabilisation and design optimisation of masks for stencil lithography: Numerical approach and experimental validation

Solid-state nanopore array membranes patterned by electron beam lithography, nanosphere lithography and aluminum anodization

Ambipolar silicon nanowire FETs with stenciled sub-µm metal gate

Grazing angle X-ray fluorescence from periodic structures on silicon and silica surfaces

Stencilled Conducting Bismuth Nanowires

Nanoporous SiN membranes patterned by wafer-scale nanosphere lithography

Application of stencil masks for ion beam lithographic patterning

Resistless Fabrication of Nanoimprint Lithography (NIL) Stamps Using Nano-Stencil Lithography

Quick and Clean: Stencil Lithography for Wafer-Scale Fabrication of Superconducting Tunnel Junctions

Etching of sub-micrometer structures through Stencil

Sputtering of (001)AlN thin films: Control of polarity by a seed layer

Organic Thin Film Transistors on Flexible Polyimide Substrates Fabricated by Full Wafer Stencil Lithography

Reusability of nanostencils for the patterning of Aluminum nanostructures by selective wet etching

Dynamic stencil lithography on full wafer scale

KFM detection of quantified charges injected into a thin SiO2 layer containing Si nps embedded by ultra low energy ion implantation using stencil lithography

100 mm dynamic stencils pattern sub-micrometre structures