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Andreea Veronica Savu

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Publications associées (56)

Double-Gate Pentacene TFTs with Improved Control in Subthreshold Region

Mihai Adrian Ionescu, Jürgen Brugger, Dimitrios Tsamados, Katrin Sidler Arnet, Jyotshna Bhandari, Andreea Veronica Savu, Nenad Cvetkovic

In this work a double-gate pentacene TFT architecture is presented. The devices are fabricated on a polyimide substrate using three aligned levels of stencil lithography along with standard photolithography, which enable a soft yet well controlled device p ...

IEEE2009

Stencilled Conducting Bismuth Nanowires

Jürgen Brugger, Sam Neuser, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo

2009

Bismuth nanowires with stencil lithography

Jürgen Brugger, Sam Neuser, Andreea Veronica Savu

2008

Quick and Clean: Stencil Lithography for Wafer-Scale Fabrication of Superconducting Tunnel Junctions

Jürgen Brugger, Andreea Veronica Savu

2008

Charging dynamics of localized 2D layers of Si nanocrystals embedded into SiO2 by stencil masked ultra low energy ion implantation process

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Andreea Veronica Savu

2008

Mechanical stabilisation and design optimisation of masks for stencil lithography: Numerical approach and experimental validation

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Andreea Veronica Savu

This paper addresses mask deformation phenomenon that frequently occurs but is highly undesirable in stencil lithography. Previously, a technique for mechanical stabilisation of stencils was proposed [M.A.F. van den Boogaart, et al., Corrugated membranes f ...

2008

Etching of sub-micrometer structures through Stencil

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Kristopher Pataky, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo

Resistless processes to realize the pattern transfer of your designs into the substrate present some advantages, as the reduction in fabrication steps. Stencil Lithography (SL) is one of the most used resistless processes and, up to now, it has mainly been ...

2008

Reusability of nanostencils for the patterning of Aluminum nanostructures by selective wet etching

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Oscar Vazquez Mena, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo

One of the major advantages of stencil lithography is the possibility to use stencils many times. However, when stencils contain nanoapertures, the clogging of the membranes limits the useful life time of the stencils. The clogging is due to the accumulati ...

Elsevier2008

Resistivity Measurements of Gold Wires Fabricated by Stencil Lithography on Flexible Polymer Substrates

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo

We report on the patterning and characterization of titanium–gold (Ti–Au) wire test structures on polyethylene naphthalate (PEN), polyethylene terephthalate (PET) and polyimide (PI) substrates. PEN, PET and PI are flexible polymers which can withstand stre ...

Elsevier2008

Sub-100 nm-scale Aluminum Nanowires by Stencil Lithography: Fabrication and Characterization

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo

We present the fabrication process and electrical characterization of sub-100 nm scale Al nanowires (NWs) fabricated by stencil lithography (SL). We use a stencil with sub- 100 nm wide nanoslits patterned by focused ion beam (FIB) milling. The stencil is a ...

2008

Etching of sub-micrometer structures through Stencil

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo

Elsevier2008

Dynamic Stencil Lithography on Full Wafer Scale

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Andreea Veronica Savu

2008

Dynamic stencil lithography on full wafer scale

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Andreea Veronica Savu

In this paper, the authors present a breakthrough extension of the stencil lithography tool and method. In the standard stencil lithography static mode, material is deposited through apertures in a membrane (stencil) on a substrate which is clamped to the ...

2008

KFM detection of quantified charges injected into a thin SiO2 layer containing Si nps embedded by ultra low energy ion implantation using stencil lithography

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Andreea Veronica Savu

2008

Metallic Nanowires by Full Wafer Stencil Lithography

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo

Aluminum and gold nanowires were fabricated using 100 mm stencil wafers containing nanoslits fabricated with a focused ion beam. The stencils were aligned and the nanowires deposited on a substrate with predefined electrical pads. The morphology and resist ...

American Chemical Society (ACS)2008

Quick & Clean: Advances in High Resolution Stencil Lithography

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo

2007

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