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Lecture

Solid Ground Curing: Principles and Examples

In course

ME-413: Introduction to additive manufacturing

The state of the art in the domain of additive production processes (the part is built by material addition without use of a shape tool) will be presented. The main application/benefits/shortcomings of the common additive processes as well as technologi ...

Description

This lecture covers the Solid Ground Curing (SGC) process, where a 3D part is built layer by layer out of a photoresist, selectively consolidated by a UV flash passing through a mask. The intelligence of the process lies in the masks made by xerography. The lecture explains the consolidation mechanism, advantages, and disadvantages of SGC compared to other processes like SLA. It also delves into the UV-LIGA process chain, detailing the production of sacrificial shape tools using UV lithography. The advantages, disadvantages, and examples of parts obtained through UV-LIGA are discussed, along with the MICROFABRICA process for fabricating non-cylindrical structures.

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Instructors (3)

Christophe Moser

Dr. Christophe Moser is Associate Professor of Microengineering and Industrial Relations at the Swiss Federal Institute of Technology in Lausanne. He was the co-founder and CEO of Ondax,Inc for ten years prior to joining EPFL. During this decade, he raised $15 million from corporate and venture capital sources to fund volume production of thick holographic components in glass and develop devices enabled by these components such as tunable add-drop multiplexers for telecommunications, ultra-narrowband notch filters for low frequency Raman systems, high power semi-conductor frequency-narrowed pumps for fiber lasers, single frequency fixed and tunable lasers for sensing and femtosecond pulse compressors for micro-machining applications. Dr. Moser has a Ph.D. in Electrical Engineering from the California Institute of Technology, a minor in finance and a bachelor degree in Physics from EPFL. He is the co-inventor of 24 patents, 14 peer reviewed scientific publications, 9 IEEE proceedings and a book chapter. Private interests include tennis, running, ski, basketball and family excursions. 2010: Associate Professor, EPFL, faculty Science Technique Ingenieur. 2000-2010: co-founder, CEO Ondax, Inc. 1995-2000: Graduate Research Assistant, California Institute of Technology. 1993-1995: Engineering Project manager , TESA. 1988-1993: Bachelor candidate in Physics, EPFL. MAIN PUBLICATIONS:

Moser C., Havermeyer F,.Ultra-narrowband tunable laserline notch filter, Appl. Phys. B, 95 (3), pp 597-601, 2009.

Moser C. ,Ho L., Havermeyer F,. Self-aligned Non-dispersive External Cavity Tunable Laser, 16 (21), 16691-16696 Optics Express, 2008.

Steckman, GJ , Moser C. et al. Volume holographic grating wavelength stabilized laser diodes, IEEE J. Of Selected Topics in Quantum Electronics, (13), 672-678, 2007.

Buse K, Havermeyer F, Liu W., Moser C, Psaltis D. Holographic Filters , Book Chapter Photorefractive Materials and their Applications, 2005.

Havermeyer, F; Liu, WH; Moser, C, et al. Volume holographic grating-based continuously tunable optical filter , Opt. Eng. 43 (9), 2017-2021, 2004.

Moser C., Maravic I., Schupp B., Adibi A, Psaltis D, Diffraction efficiency of localized holograms in doubly doped LiNbO3 crystals, Opt. Lett. 25: (17),1243-1245, 2000.

Eric Boillat

Jürgen Brugger

I am a Professor of Microengineering and co-affiliated to Materials Science. Before joining EPFL I was at the MESA Research Institute of Nanotechnology at the University of Twente in the Netherlands, at the IBM Zurich Research Laboratory, and at the Hitachi Central Research Laboratory, in Tokyo, Japan. I received a Master in Physical-Electronics and a PhD degree from Neuchâtel University, Switzerland. Research in my laboratory focuses on various aspects of MEMS and Nanotechnology. My group contributes to the field at the fundamental level as well as in technological development, as demonstrated by the start-ups that spun off from the lab. In our research, key competences are in micro/nanofabrication, additive micro-manufacturing, new materials for MEMS, increasingly for wearable and biomedical applications. Together with my students and colleagues we published over 200 peer-refereed papers and I had the pleasure to supervise over 25 PhD students. Former students and postdocs have been successful in receiving awards and starting their own scientific careers. I am honoured for the appointment in 2016 as Fellow of the IEEE “For contributions to micro and nano manufacturing technology”. In 2017 my lab was awarded an ERC AdvG in the field of advanced micro-manufacturing.

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Related concepts (32)

Microfabrication

Microfabrication is the process of fabricating miniature structures of micrometre scales and smaller. Historically, the earliest microfabrication processes were used for integrated circuit fabrication, also known as "semiconductor manufacturing" or "semiconductor device fabrication". In the last two decades microelectromechanical systems (MEMS), microsystems (European usage), micromachines (Japanese terminology) and their subfields, microfluidics/lab-on-a-chip, optical MEMS (also called MOEMS), RF MEMS, PowerMEMS, BioMEMS and their extension into nanoscale (for example NEMS, for nano electro mechanical systems) have re-used, adapted or extended microfabrication methods.

Photoresist

A photoresist (also known simply as a resist) is a light-sensitive material used in several processes, such as photolithography and photoengraving, to form a patterned coating on a surface. This process is crucial in the electronics industry. The process begins by coating a substrate with a light-sensitive organic material. A patterned mask is then applied to the surface to block light, so that only unmasked regions of the material will be exposed to light. A solvent, called a developer, is then applied to the surface.

Etching (microfabrication)

Etching is used in microfabrication to chemically remove layers from the surface of a wafer during manufacturing. Etching is a critically important process module, and every wafer undergoes many etching steps before it is complete. For many etch steps, part of the wafer is protected from the etchant by a "masking" material which resists etching. In some cases, the masking material is a photoresist which has been patterned using photolithography. Other situations require a more durable mask, such as silicon nitride.

Solid-propellant rocket

A solid-propellant rocket or solid rocket is a rocket with a rocket engine that uses solid propellants (fuel/oxidizer). The earliest rockets were solid-fuel rockets powered by gunpowder; they were used in warfare by the Chinese, Indians, Mongols and Persians as early as the 13th century. All rockets used some form of solid or powdered propellant up until the 20th century, when liquid-propellant rockets offered more efficient and controllable alternatives.

Xerography

Xerography is a dry photocopying technique. Originally called electrophotography, it was renamed xerography—from the n roots ξηρός xeros, meaning "dry" and -γραφία -graphia, meaning "writing"—to emphasize that unlike reproduction techniques then in use such as cyanotype, the process of xerography used no liquid chemicals. Xerography was invented by American physicist Chester Carlson, based significantly on contributions by Hungarian physicist Pál Selényi. Carlson applied for and was awarded on October 6, 1942.

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