Publications associées à Direct imprinting of organic-inorganic hybrid materials into high aspect ratio sub-100 nm structures

Publications associées (24)

Semiconductor-based device architectures in multimaterial fibers

Semiconductor materials have given rise to today's digital technology and consumer electronics. Widespread adoption is closely linked to the ability to process and integrate them in devices at scale. Where flexibility and large surfaces are required, such ...

EPFL2023

Controlling motion at the nanoscale with light

Mintae Chung

Optical manipulation at the micro- nano-scale is a fascinating topic due to its inherent non-invasive properties and multifaceted applications in various fields such as biology, sensing, micro-fluidics, and micro- nano-robotics. This thesis involves intens ...

EPFL2022

A Low-Temperature Annealing Method for Alloy Nanostructures and Metasurfaces: Unlocking a Novel Degree of Freedom

Olivier Martin, Christian Santschi, Hsiang-Chu Wang, Jeonghyeon Kim, Debdatta Ray

The material and exact shape of a nanostructure determine its optical response, which is especially strong for plasmonic metals. Unfortunately, only a few plasmonic metals are available, which limits the spectral range where these strong optical effects ca ...

Wiley-V C H Verlag Gmbh2022

Scalable fabrication of functional nanostructures on stretchable substrates by capillary-assisted particle assembly and adhesion lithography

Henry Shao-Chi Yu

The fabrication of metallic nanostructures on stretchable substrates enables specific applications that exploit the combination of the nano-scale phenomena and the mechanical tunability of the physical dimensions of the nanostructures. Due to the large dif ...

EPFL2022

Precise Capillary‐Assisted Nanoparticle Assembly in Reusable Templates

Olivier Martin, Jürgen Brugger, Giovanni Boero, Hsiang-Chu Wang, Ana Conde Rubio, Henry Shao-Chi Yu

Capillary-assisted particle assembly (CAPA) in predefined topographical templates is a scalable method for the precise positioning of nanoscale objects on various surfaces. High-resolution CAPA templates are typically fabricated by expensive electron-beam ...

2022

Edge-Contact MoS2 Transistors Fabricated Using Thermal Scanning Probe Lithography

Jürgen Brugger, Giovanni Boero, Xia Liu, Ana Conde Rubio

The science and engineering of two-dimensional materials (2DMs), in particular, of 2D semiconductors, is advancing at a thriving pace. It is well known that these delicate few-atoms thick materials can be damaged during the processing toward their integrat ...

2022

Controlled filamentation instability as a scalable fabrication approach to flexible metamaterials

Fabien Sorin, Louis Marie Philippe Martin-Monier, Pierre-Luc Eloi Piveteau, William Nicolas Duncan Esposito

Long and flexible arrays of nanowires find impactful applications in sensing, photonics, and energy harvesting. Conventional manufacturing relies largely on lithographic methods limited in wafer size, rigidity, and machine write time. Here, we report a sca ...

Nature Portfolio2022

Fabrication and applications of AuAg alloy metasurfaces and hybrid metal dielectric nanoantennas

Debdatta Ray

The most prevalent materials used in the field of plasmonics are Au and Ag. However, for the past few years, the plasmonic community has also been looking for alternative materials that have lower losses than Au and higher stability than Ag. This thesis is ...

EPFL2021

Nanopillars Enabling III-V Integration on Si (100) and (111)

Lucas Güniat

The majority of current semiconductor technologies are built on Si (100), such as the CMOS technology, or conventional solar cell devices. III-V semiconductors offer great perspectives given their high carrier mobility and direct band gap. However their in ...

EPFL2021

Femtosecond laser-based optomechanical processes for permanent and high-precision fine alignment of optical systems

Saood Ibni Nazir

Miniaturization has been at the forefront of scientific research in the past decade covering diverse areas such as electronics, mechanics, and optics. While 'small is beautiful' may be a vast generalization, the true benefits of miniaturization are especia ...

EPFL2021

Fabrication of plasmonic structures with well-controlled nanometric features: a comparison between lift-off and ion beam etching

Olivier Martin, Christian Santschi, Banafsheh Abasahl

After providing a detailed overview of nanofabrication techniques for plasmonics, we discuss in detail two different approaches for the fabrication of metallic nanostructures based on e-beam lithography. The first approach relies on a negative e-beam resis ...

IOP PUBLISHING LTD2021

Electron Beam Induced Copper Deposition from Carboxylate Precursors and the Study of Underlying Growth Mechanisms

Luisa Berger

The fabrication of defined and high-quality metal nanostructures is an ongoing topic of research. Direct-write deposition of copper nanostructures is of great value for many fields of research and industrial applications. Focused electron beam induced depo ...

EPFL2020

Template-assisted electrodeposition of nickel and nickel copper 3D microcomponents

Patrik Schürch

New types of metamaterials and architectured material require metallic materials with precise structural design in the microscale. However, additivemanufacturing of metallic structures in themicroscale has proven difficult, as the demand for the material q ...

EPFL2020

Computational rule-based approach for corner correction of non-Manhattan geometries in mask aligner photolithography

Toralf Scharf, Wilfried Noell, Chen Yan, Raoul Kirner

In proximity mask aligner photolithography, diffraction of light at the mask pattern is the predominant source for image shape distortions such as line end shortening and corner rounding. One established method to mitigate the impact of diffraction is opti ...

2019

Cell-Imprint Surface Modification by Contact Photolithography-Based Approaches: Direct-Cell Photolithography and Optical Soft Lithography Using PDMS Cell Imprints

Philippe Renaud, Harald Van Lintel

New cell-imprint surface modification techniques based on direct-cell photolithography and optical soft lithography using poly(dimethylsiloxane) (PDMS) cell imprints are presented for enhanced cell-based studies. The core concept of engineering materials f ...

AMER CHEMICAL SOC2019

Characterization of Amorphous Silicon Based Microchannel Plates with High Aspect Ratio

Christophe Ballif, Nicolas Würsch, Janina Christine Isabelle Löffler, Samira Alexandra Frey

Microchannel plates (MCPs) fabricated out of hydrogenated amorphous silicon offer a promising alternative to conventional lead glass ones. Progress in the fabrication process has allowed for detectors with higher aspect ratios, which significantly increase ...

IEEE2019

Fixed DNA Molecule Arrays for High-Throughput Single DNA-Protein Interaction Studies

Vytautas Navikas

The DNA Curtains assay is a recently developed experimental platform for protein-DNA interaction studies at the single-molecule level that is based on anchoring and alignment of DNA fragments. The DNA Curtains so far have been made by using chromium barrie ...

AMER CHEMICAL SOC2019

Biodegradable Frequency‐Selective Magnesium Radio‐Frequency Microresonators for Transient Biomedical Implants

Jürgen Brugger, Giovanni Boero, Matthieu Jean Michel Rüegg

Bioresorbable implantable medical devices show a great potential for applications requiring medical care over well‐defined periods of time. Once their function is fulfilled, such implants naturally degrade and resorb in the body, which eliminates adverse l ...

2019

Scanning Probe-Directed Assembly and Rapid Chemical Writing Using Nanoscopic Flow of Phospholipids

Vytautas Navikas

Nanofluidic systems offer a huge potential for discovery of new molecular transport and chemical phenomena that can be employed for future technologies. Herein, we report on the transport behavior of surface-reactive compounds in a nanometer-scale flow of ...

AMER CHEMICAL SOC2019

Fabrication and Characterisation of Epitaxial PMN-PT Nano-structures

Xiao Di

Downscaling of the minimal feature size, or the gate length has been the key for the exponential im-provement of the performance of the logic CMOS integrated circuits over the last six decades. How-ever, since about 2003, some fundamental limits in the dev ...

EPFL2019