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Personne

Wilfried Noell

Cette personne a quitté l’EPFL

Publications associées (35)

Veuillez noter qu'il ne s'agit pas d'une liste complète des publications de cette personne. Elle inclut uniquement les travaux sémantiquement pertinents. Pour une liste complète, veuillez consulter Infoscience.

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Personnes menant des recherches similaires (1)

Hans Peter Herzig

Dr. Hans Peter Herzig is Professor at the Ecole Polytechnique Fédérale de Lausanne (EPFL) and Past President of the European Optical Society (EOS). His current research interests include refractive and diffractive micro-optics, nano-scale optics and optical MEMS. Hans Peter Herzig received his diploma in physics from the Swiss Federal Institute of Technology in Zürich, Switzerland, in 1978. From 1978 to 1982 he was a scientist with the Optics Development Department of Kern in Aarau, Switzerland, working in lens design and optical testing. In 1983, he became a graduate research assistant with the Applied Optics Group at the Institute of Microtechnology of the University of Neuchâtel, Switzerland, working in the field of holographic optical elements. In 1987, he received his PhD degree in optics. From 1989 to 2001 he was head of the micro-optics research group in Neuchâtel. From 2002 to 2008 he was a full professor and head of the Applied Optics Laboratory at the University of Neuchâtel. Professor Herzig joined the faculty at EPFL in January 2009. He is member of OSA, IEEE Photonics Society and Fellow of EOS. 2009-2010 he was President of the European Optical Society (EOS), 2001-2009 Vice-President of the Swiss Society of Optics and Microscopy and 2012-2014 Vice-President of ICO. Dr. Herzig is in the editorial board of different scientific journals (JM3, Optical Review, JEOS). He served as Conference Chairman for international conferences of EOS, IEE, IEEE/LEOS, OSA and SPIE; and as Guest Editor of three special issues of IEEE, OSA journals. He is editor of a well-known book on micro-optics (published in English and Chinese), author of 14 book chapters, over 150 peer reviewed articles and 300 conference proceedings.

Wilfried Noell

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Printing sub-micron structures using Talbot mask-aligner lithography with a 193 nm CW laser light source

Tolerancing the surface form of aspheric microlenses manufactured by wafer-level optics techniques

Large micromirror array for generating programmable slit masks for Multi-Object Spectroscopy