Andreea Veronica Savu

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Related publications (56)

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100 mm dynamic stencils pattern sub-micrometre structures

Jürgen Brugger, Andreea Veronica Savu, Shenqi Xie

Dynamic stencil lithography uses a moving shadow-mask to draw patterns by having directionally evaporated material deposited through the stencil apertures onto the substrate. Sub-micrometre, two- dimensional patterning is demonstrated at full 100 mm wafer ...

2011

Robust PECVD SiC membrane made for stencil lithography

Jürgen Brugger, Andreea Veronica Savu, Oscar Vazquez Mena, Katrin Sidler Arnet, Shenqi Xie, Wei Tang

Stencil lithography (SL) is a shadow mask technique which allows parallel, resistless, micro- and nano- patterning of material through apertures created in a membrane (stencil) onto a substrate. The stencils are usually made of LPCVD low-stress SiN due to ...

Elsevier2011

Vertically-Stacked Si Nanowire FETs with sub-micrometer Gate-All-Around polysilicon gates patterned by nanostencil lithography

Giovanni De Micheli, Yusuf Leblebici, Jürgen Brugger, Andreea Veronica Savu, Davide Sacchetto, Michail Zervas, Shenqi Xie

2011

All-stencil transistor fabrication on 3D silicon substrates

Jürgen Brugger, Luis Guillermo Villanueva Torrijo, Andreea Veronica Savu, Oscar Vazquez Mena, Peter Vettiger, Katrin Sidler Arnet, Cyrille Hibert, Cristina Martin Olmos, Philippe Langlet

The standard lithographic techniques to fabricate electronic components involve the use of polymers, baking steps and chemicals. This typically restricts their application to flat substrates made up of standard materials. Stencil lithography has been propo ...

Iop Publishing Ltd2012

Metallic Nanowires by Full Wafer Stencil Lithography

Jürgen Brugger, Luis Guillermo Villanueva Torrijo, Andreea Veronica Savu, Oscar Vazquez Mena, Marc Antonius Friedrich van den Boogaart, Katrin Sidler Arnet

Aluminum and gold nanowires were fabricated using 100 mm stencil wafers containing nanoslits fabricated with a focused ion beam. The stencils were aligned and the nanowires deposited on a substrate with predefined electrical pads. The morphology and resist ...

American Chemical Society (ACS)2008

Charging dynamics of localized 2D layers of Si nanocrystals embedded into SiO2 by stencil masked ultra low energy ion implantation process

Jürgen Brugger, Andreea Veronica Savu, Marc Antonius Friedrich van den Boogaart

2008

Andreea Veronica Savu

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100 mm dynamic stencils pattern sub-micrometre structures

Robust PECVD SiC membrane made for stencil lithography

Vertically-Stacked Si Nanowire FETs with sub-micrometer Gate-All-Around polysilicon gates patterned by nanostencil lithography

All-stencil transistor fabrication on 3D silicon substrates

Metallic Nanowires by Full Wafer Stencil Lithography

Organic half-wave rectifier fabricated by stencil lithography on flexible substrate

Three-level Stencil Alignment Fabrication of a High-k Gate Stack Organic Thin Film Transistor

Quick and Clean: Stencil Lithography for Wafer-Scale Fabrication of Superconducting Tunnel Junctions

Charging dynamics of localized 2D layers of Si nanocrystals embedded into SiO2 by stencil masked ultra low energy ion implantation process

Dynamic Stencil Lithography on Full Wafer Scale

Bismuth nanowires with stencil lithography

Metallic Nanodot Arrays Fabricated by Stencil Lithography on SiO2 and Polymer Substrates

Flexible Membranes Improve Resolution in Stencil Lithography

Thermal control extends heated stencil’s life-time

Etching of sub-micrometer structures through Stencil

Quick & Clean: Advances in High Resolution Stencil Lithography