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Oscar Vazquez Mena

Cette personne a quitté l’EPFL

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Publications associées (44)

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Patterning of parallel nanobridge structures by reverse nanostencil lithography using an edge-patterned stencil

Jürgen Brugger, Oscar Vazquez Mena

We propose a new process for forming parallel nanobridge patterns by nanostencil lithography. In this process, a low-stress silicon nitride stencil with parallel nanobridge structures is fabricated by a new edge patterning technique where those nanobridges ...

2007

Nanoporous SiN membranes patterned by wafer-scale nanosphere lithography

Jürgen Brugger, Andreea Veronica Savu, Oscar Vazquez Mena

Nanoporous SiN membranes are interesting for a number of applications, e.g. stenciling, filtration, or tissue engineering [1-3]. The patterning of the pores requires a high resolution lithographic tool. Focused ion beam milling or e-beam lithography fulfil ...

2010

Resistless Fabrication of Nanoimprint Lithography (NIL) Stamps Using Nano-Stencil Lithography

Jürgen Brugger, Luis Guillermo Villanueva Torrijo, Andreea Veronica Savu, Oscar Vazquez Mena, Katrin Sidler Arnet, Cristina Martin Olmos

In order to keep up with the advances in nano-fabrication, alternative, cost-efficient lithography techniques need to be implemented. Two of the most promising are nanoimprint lithography (NIL) and stencil lithography. We explore here the possibility of fa ...

MDPI2013

Focused Ion Beam: A Versatile Technique for the Fabrication of Nano-Devices

Olivier Martin, Jürgen Brugger, Christian Santschi, Oscar Vazquez Mena

2009

Towards Reliable 100-Nanometer Scale Stencil Lithography on Full Wafer: Progress AND Challenges

Jürgen Brugger, Oscar Vazquez Mena, Marc Antonius Friedrich van den Boogaart

We have fabricated new and robust nanostencil membranes for the surface patterning of 100-nm scale Al wires on full wafer scale. The stencil membranes are mechanically reinforced with corrugations, making them more stable against accumulated stress. The ap ...

IEEE2007

Direct fabrication of NIL stamps using Stencil Lithography

Jürgen Brugger, Luis Guillermo Villanueva Torrijo, Oscar Vazquez Mena, Thomas Kiefer

Stencil Lithography has been used for the rapid and low cost fabrication of high resolution NIL stamps. The stamps are fabricated by Al deposition through a nanoscale shadow mask and subsequent Si etching. Features down to 50 nm in the stamps have been ach ...

2008

Integrated Nickel Micro-Nano-Hall Sensors on SU-8 Cantilevers for Scanning Hall Probe Microscopy

Jürgen Brugger, Giovanni Boero, Christian Santschi, Radivoje Popovic, Oscar Vazquez Mena, Schahrazede-Lila Mouaziz

We report the fabrication and characterization of nickel Hall sensors integrated on SU-8 cantilevers. Sensors having active area down to 1x1 μm 2 show a magnetic field resolution better than 1μT/Hz 1/2 in the thermal noise frequency range. The fabricated d ...

IEEE2007

Etching of sub-micrometer structures through Stencil

Jürgen Brugger, Luis Guillermo Villanueva Torrijo, Andreea Veronica Savu, Oscar Vazquez Mena, Marc Antonius Friedrich van den Boogaart, Katrin Sidler Arnet, Kristopher Pataky

Resistless processes to realize the pattern transfer of your designs into the substrate present some advantages, as the reduction in fabrication steps. Stencil Lithography (SL) is one of the most used resistless processes and, up to now, it has mainly been ...

2008

Localized Ion Implantation Through Micro/Nanostencil Masks

Jürgen Brugger, Luis Guillermo Villanueva Torrijo, Oscar Vazquez Mena, Cristina Martin Olmos, Philippe Langlet

A method is presented that allows the deﬁnition of micrometer- and submicrometer-sized implanted structures in silicon without using photoresist patterning. The process is based on the use of stencils as masks in a conventional ion implanter, and is tested ...

Institute of Electrical and Electronics Engineers2011

Reusability of nanostencils for the patterning of Aluminum nanostructures by selective wet etching

Jürgen Brugger, Luis Guillermo Villanueva Torrijo, Andreea Veronica Savu, Oscar Vazquez Mena, Marc Antonius Friedrich van den Boogaart

One of the major advantages of stencil lithography is the possibility to use stencils many times. However, when stencils contain nanoapertures, the clogging of the membranes limits the useful life time of the stencils. The clogging is due to the accumulati ...

Elsevier2008

Reverse transfer of nanostencil patterns using intermediate sacrificial layer and lift-off process

Jürgen Brugger, Oscar Vazquez Mena, Marc Antonius Friedrich van den Boogaart

We propose a new process by which patterns produced by nanostencil lithography can be reversed, so that the final pattern on the substrate has the same contrast (filled or empty) as that of the stencil. In this process, the stencil pattern is first formed ...

2006

Robust PECVD SiC membrane made for stencil lithography

Jürgen Brugger, Andreea Veronica Savu, Oscar Vazquez Mena, Katrin Sidler Arnet, Shenqi Xie, Wei Tang

Stencil lithography (SL) is a shadow mask technique which allows parallel, resistless, micro- and nano- patterning of material through apertures created in a membrane (stencil) onto a substrate. The stencils are usually made of LPCVD low-stress SiN due to ...

Elsevier2011

All-stencil transistor fabrication on 3D silicon substrates

Jürgen Brugger, Luis Guillermo Villanueva Torrijo, Andreea Veronica Savu, Oscar Vazquez Mena, Peter Vettiger, Katrin Sidler Arnet, Cyrille Hibert, Cristina Martin Olmos, Philippe Langlet

The standard lithographic techniques to fabricate electronic components involve the use of polymers, baking steps and chemicals. This typically restricts their application to flat substrates made up of standard materials. Stencil lithography has been propo ...

Iop Publishing Ltd2012

Metallic Nanowires by Full Wafer Stencil Lithography

Jürgen Brugger, Luis Guillermo Villanueva Torrijo, Andreea Veronica Savu, Oscar Vazquez Mena, Marc Antonius Friedrich van den Boogaart, Katrin Sidler Arnet

Aluminum and gold nanowires were fabricated using 100 mm stencil wafers containing nanoslits fabricated with a focused ion beam. The stencils were aligned and the nanowires deposited on a substrate with predefined electrical pads. The morphology and resist ...

American Chemical Society (ACS)2008

Analysis and Applications of Nanostructures Created by Stencil Lithography

Jürgen Brugger, Luis Guillermo Villanueva Torrijo, Oscar Vazquez Mena

2009

Fabrication of Metallic Nanodots by Stencil Lithography for Localized Surface Plasmon Resonance Biosensing

Jürgen Brugger, Luis Guillermo Villanueva Torrijo, Oscar Vazquez Mena

2010

Nanostencil and InkJet Printing for Bionanotechnology Applications

Jürgen Brugger, Oscar Vazquez Mena, Kristopher Pataky

In this contribution we describe the application of Ink-Jet printing and Stencil Lithography in bionanotechnology. Both techniques are alternative patterning methods that can be used for the fabrication of biocompatible micro- and nanostructures out of the ...

2009

Oscar Vazquez Mena

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Patterning of parallel nanobridge structures by reverse nanostencil lithography using an edge-patterned stencil

Nanoporous SiN membranes patterned by wafer-scale nanosphere lithography

Resistless Fabrication of Nanoimprint Lithography (NIL) Stamps Using Nano-Stencil Lithography

Focused Ion Beam: A Versatile Technique for the Fabrication of Nano-Devices

Towards Reliable 100-Nanometer Scale Stencil Lithography on Full Wafer: Progress AND Challenges

Direct fabrication of NIL stamps using Stencil Lithography

Integrated Nickel Micro-Nano-Hall Sensors on SU-8 Cantilevers for Scanning Hall Probe Microscopy

Etching of sub-micrometer structures through Stencil

Localized Ion Implantation Through Micro/Nanostencil Masks

Reusability of nanostencils for the patterning of Aluminum nanostructures by selective wet etching

Reverse transfer of nanostencil patterns using intermediate sacrificial layer and lift-off process

Robust PECVD SiC membrane made for stencil lithography

All-stencil transistor fabrication on 3D silicon substrates

Metallic Nanowires by Full Wafer Stencil Lithography

Analysis and Applications of Nanostructures Created by Stencil Lithography

Fabrication of Metallic Nanodots by Stencil Lithography for Localized Surface Plasmon Resonance Biosensing

Nanostencil and InkJet Printing for Bionanotechnology Applications

Metallic Nanodot Arrays Fabricated by Stencil Lithography on SiO2 and Polymer Substrates

Flexible Membranes Improve Resolution in Stencil Lithography

Minimized Blurring in Stencil Lithography using a Compliant Membrane