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Marc Antonius Friedrich van den Boogaart

Cette personne a quitté l’EPFL

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Publications associées (37)

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Reusability of nanostencils for the patterning of Aluminum nanostructures by selective wet etching

Jürgen Brugger, Luis Guillermo Villanueva Torrijo, Andreea Veronica Savu, Oscar Vazquez Mena, Marc Antonius Friedrich van den Boogaart

One of the major advantages of stencil lithography is the possibility to use stencils many times. However, when stencils contain nanoapertures, the clogging of the membranes limits the useful life time of the stencils. The clogging is due to the accumulati ...

Elsevier2008

Dynamic stencil lithography on full wafer scale

Jürgen Brugger, Andreea Veronica Savu, Marc Antonius Friedrich van den Boogaart

In this paper, the authors present a breakthrough extension of the stencil lithography tool and method. In the standard stencil lithography static mode, material is deposited through apertures in a membrane (stencil) on a substrate which is clamped to the ...

2008

Formation of Metal Nano- and Micro-patterns on Self-Assembled Monolayers Using Pulsed Laser Deposition through Nanostencils and Electroless Deposition

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

Patterns of noble-metal structures on top of self-assembled monolayers (SAMs) on Au and SiO2 substrates have been prepared following two approaches. The first approach consists of pulsed laser deposition (PLD) of Pt, Pd, Au, or Cu through nano- and microst ...

2006

Dry etching for the correction of gap-induced blurring and improved pattern resolution in nanostencil lithography

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

We present nanostencil lithography as a new and parallel nanopatterning technique for batch fabrication of micro/ nanoelectromechanical systems (MEMS/NEMS) with high throughput and resolution. We use nanostencil lithography for the purpose of integrating n ...

2007

Reverse transfer of nanostencil patterns using intermediate sacrificial layer and lift-off process

Jürgen Brugger, Oscar Vazquez Mena, Marc Antonius Friedrich van den Boogaart

We propose a new process by which patterns produced by nanostencil lithography can be reversed, so that the final pattern on the substrate has the same contrast (filled or empty) as that of the stencil. In this process, the stencil pattern is first formed ...

2006

Full wafer integration of NEMS on CMOS by nanostencil lithography

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

Wafer scale nanostencil lithography is used to define 200 nm scale mechanically resonating silicon cantilevers monolithically integrated into CMOS circuits. We demonstrate the simultaneous patterning of ~2000 nanodevices by post-processing standard CMOS wa ...

2006

KFM detection of quantified charges injected into a thin SiO2 layer containing Si nps embedded by ultra low energy ion implantation using stencil lithography

Jürgen Brugger, Andreea Veronica Savu, Marc Antonius Friedrich van den Boogaart

2008

A Compact and Low-Power CMOS Circuit for Fully-Integrated NEMS Resonators

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

This brief presents a fully integrated nanoelectromechanical system (NEMS) resonator, operable at frequencies in the megahertz range, together with a compact built-in CMOS interfacing circuitry. The proposed low-power second-generation current conveyor cir ...

2007

Metallic Nanowires by Full Wafer Stencil Lithography

Jürgen Brugger, Luis Guillermo Villanueva Torrijo, Andreea Veronica Savu, Oscar Vazquez Mena, Marc Antonius Friedrich van den Boogaart, Katrin Sidler Arnet

Aluminum and gold nanowires were fabricated using 100 mm stencil wafers containing nanoslits fabricated with a focused ion beam. The stencils were aligned and the nanowires deposited on a substrate with predefined electrical pads. The morphology and resist ...

American Chemical Society (ACS)2008

Nanostenciling for combinatorial fabrications and interconnections of nanopatterns and microelectrodes

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Sébastien Gauthier

Stencil lithography is used for patterning and connecting nanostructures with metallic microelectrodes in ultrahigh vacuum. Microelectrodes are fabricated by static stencil deposition through a thin silicon nitride membrane. Arbitrary nanoscale patterns ar ...

2007

Charging dynamics of localized 2D layers of Si nanocrystals embedded into SiO2 by stencil masked ultra low energy ion implantation process

Jürgen Brugger, Andreea Veronica Savu, Marc Antonius Friedrich van den Boogaart

2008

Dynamic Stencil Lithography on Full Wafer Scale

Jürgen Brugger, Andreea Veronica Savu, Marc Antonius Friedrich van den Boogaart

2008

Combining micelle self-assembly with nanostencil lithography to create periodic/aperiodic micro- /nanopatterns on surfaces

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Cyrille Hibert, Sivashankar Krishnamoorthy

Wiley2008

Stencil assisted reactive ion etching for micro and nano patterning

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

Stencil-assisted oxygen reactive ion etching is a low-cost and parallel process for the replication of micrometric and nanometric patterns in any organic material. This lithography process allows the patterning of organic material non sensitive to electron ...

2008

Etching of sub-micrometer structures through Stencil

Jürgen Brugger, Luis Guillermo Villanueva Torrijo, Andreea Veronica Savu, Oscar Vazquez Mena, Marc Antonius Friedrich van den Boogaart, Katrin Sidler Arnet

Elsevier2008

Quick & Clean: Advances in High Resolution Stencil Lithography

Jürgen Brugger, Luis Guillermo Villanueva Torrijo, Andreea Veronica Savu, Oscar Vazquez Mena, Marc Antonius Friedrich van den Boogaart, Katrin Sidler Arnet

2007

Controlled synthesis of silicon nanocrystals into a thin SiO2 layer synthesized by stencil-masked ultra-low energy ion implantation

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

2008