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Marc Antonius Friedrich van den Boogaart

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Related publications (37)

Synthesis of localized 2D-layers of silicon nanoparticles embedded in a SiO2 layer by a stencil-masked ultra-low energy ion implantation process

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

We propose an original approach called “stencil-masked ion implantation process” to perform a spatially localized synthesis of a limited number of Si nanoparticles (nps) within a thin SiO2 layer. This process consists in implanting silicon ions at ultra-lo ...

Wiley2007

Predicting mask distortion, clogging and pattern transfer for stencil lithography

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

One of the ultimate tasks for stencil lithography is the ability to fabricate arrays of structures with controlled dimensions on the nanometer scale precisely positioned on a suitable surface. The race to shrink feature sizes requires the limits of convent ...

2007

Selective deposition of gold nanoparticles using Van der Waals interactions

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

Gold nanoparticles with hydrophobic surface have been deposited on a silicon substrate chemically patterned by reactive ion etching through a stencil mask and chemical vapour deposition of alkyl silanes. After deposition by dipping and adequate rinsing, th ...

2007

Quick & Clean: Advances in High Resolution Stencil Lithography

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo

2007

Nanostenciling for fabrication and interconnection of nanopatterns and microelectrodes

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Sébastien Gauthier

Stencil lithography is used for patterning and connecting nanostructures with metallic microelectrodes in ultrahigh vacuum. Microelectrodes are fabricated by static stencil deposition through a thin silicon nitride membrane. Arbitrary nanoscale patterns ar ...

AIP American Institute of Physics2007

A Compact and Low-Power CMOS Circuit for Fully-Integrated NEMS Resonators

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

This brief presents a fully integrated nanoelectromechanical system (NEMS) resonator, operable at frequencies in the megahertz range, together with a compact built-in CMOS interfacing circuitry. The proposed low-power second-generation current conveyor cir ...

2007

Towards Reliable 100-Nanometer Scale Stencil Lithography on Full Wafer: Progress AND Challenges

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Oscar Vazquez Mena

We have fabricated new and robust nanostencil membranes for the surface patterning of 100-nm scale Al wires on full wafer scale. The stencil membranes are mechanically reinforced with corrugations, making them more stable against accumulated stress. The ap ...

IEEE2007

Permalloy thin films exchange coupled to arrays of cobalt islands

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

Periodic arrays of elongated cobalt islands exchange coupled to continuous Permalloy thin films were fabricated using silicon nitride stencil masks and the magnetic spin configurations during magnetization reversal were studied with photoemission electron ...

AIP American Institute of Physics2006

Fabrication of metallic patterns by microstencil lithography on polymer surfaces suitable as microelectrodes in integrated microfluidic systems

Jürgen Brugger, Nao Takano, Marc Antonius Friedrich van den Boogaart, Helmut Knapp

Microstencil lithography, i.e. local deposition of micrometer scale patterns through small shadow masks, is a promising method for metal micropattern definition on polymer substrates that cannot be structured using organic-solvent-based photoresist technol ...

2006

Silicon Supported Membranes for Improved Large-Area and High-Density Micro/Nanostencil Lithography

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

In this paper, the fabrication and use of stencils for full-wafer scale shadow mask (stencil) lithography is described. The stencils fabricated via microelectromechanical systems are mechanically stabilized and show clearly reduced stress-induced membrane ...

Institute of Electrical and Electronics Engineers2006

Photoluminescence characterization of few-nanocrystals electronic devices

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

Photoluminescence (PL) spectroscopy is demonstrated as a suitable technique to characterize silicon nanocrystals (Si-NCs)-based nonvolatile memory devices. The 2D array of Si-NCs forming the floating gate is obtained by low-energy ion implantation in thin ...

2006

Stencil lithography : an ancient technique for advanced micro- and nano-patterning

Marc Antonius Friedrich van den Boogaart

This work describes the advancements made in micro and nano patterning via stencil lithography. Stencil lithography is a resist-less and direct pattern technique where a controlled amount of material is deposited through apertures on to a substrate in a va ...

EPFL2006

Full wafer integration of NEMS on CMOS by nanostencil lithography

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

Wafer scale nanostencil lithography is used to define 200 nm scale mechanically resonating silicon cantilevers monolithically integrated into CMOS circuits. We demonstrate the simultaneous patterning of ~2000 nanodevices by post-processing standard CMOS wa ...

2006

Corrugated membranes for improved pattern definition with micro/nanostencil lithography

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

We present a MEMS process for the fabrication of arbitrary (adaptable to specific aperture geometries) stabilization of silicon nitride membranes to be used as miniature shadow masks or (nano) stencils. Stabilization was realized by the fabrication of sili ...

2006

Reverse transfer of nanostencil patterns using intermediate sacrificial layer and lift-off process

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Oscar Vazquez Mena

We propose a new process by which patterns produced by nanostencil lithography can be reversed, so that the final pattern on the substrate has the same contrast (filled or empty) as that of the stencil. In this process, the stencil pattern is first formed ...

2006

Formation of Metal Nano- and Micro-patterns on Self-Assembled Monolayers Using Pulsed Laser Deposition through Nanostencils and Electroless Deposition

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

Patterns of noble-metal structures on top of self-assembled monolayers (SAMs) on Au and SiO2 substrates have been prepared following two approaches. The first approach consists of pulsed laser deposition (PLD) of Pt, Pd, Au, or Cu through nano- and microst ...

2006

Complex oxide nanostructures by pulsed laser deposition through nanostencils

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

We achieved parallel nanoscale patterning of ferroelectric complex oxides by pulsed laser deposition through a nanostencil (i.e., through a pattern of apertures in a thin free-standing membrane). Ordered arrays of nanostructured barium titanate (BaTiO3) we ...

AIP American Institute of Physics2005

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