Publications de Jürgen Brugger

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Stencil-assisted oxygen reactive ion etching is a low-cost and parallel process for the replication of micrometric and nanometric patterns in any organic material. This lithography process allows the patterning of organic material non sensitive to electron ...

Grayscale structured surfaces with nanometer-scale features are used in a growing number of applications in optics and fluidics. Thermal scanning probe lithography achieves a lateral resolution below 10 nm and a vertical resolution below 1 nm, but its maxi ...

The application of Au/Si3N4 stencil masks for the transfer of patterns using different MeV-ion beams with various substrates has been investigated. The techniques investigated were namely, conventional lithography with positive- and negative-tone resist po ...

Cells are able to perceive complex mechanical cues from their microenvironment, which in turn influences their development. Although the understanding of these intricate mechanotransductive signals is evolving, the precise roles of substrate microtopograph ...

The continuous tunability of iron oxide nanoparticle dimensions is demonstrated using the pH controlled loading of ferric nitrate from aqueous solution into polystyrene–block–polyacrylic acid reverse micelles deposited on a silicon substrate. Quasi-hexagon ...

In order to keep up with the advances in nano-fabrication, alternative, cost-efficient lithography techniques need to be implemented. Two of the most promising are nanoimprint lithography (NIL) and stencil lithography. We explore here the possibility of fa ...

We present a percolation based model which is suitable for the design of sensors based on highly ordered nanogap arrays. Monte-Carlo simulations and analytical expressions are used to calculate the sensitivity and dynamic range as a function of the topolog ...

The success of high-speed atomic force microscopy in imaging molecular motors1, enzymes2 and microbes3 in liquid environments suggests that the technique could be of significant value in a variety of areas of nanotechnology. However, the majority of atomic ...

This paper presents a resist-less process for parallel fabrication of sub-micrometer Al-AlOx-Al superconducting tunnel junctions. A custom stencil is fabricated containing 200 nm low stress SiN membranes with micro-apertures. The stencil is aligned and cla ...

We have developed a new hybrid AFM probe combining an SU-8 polymer body with a full tungsten cantilever having a nanometric tip. The fabrication is based on surface micromachining a silicon wafer, where tungsten is sputter deposited in oxidation sharpened ...

Fused deposition modeling (FDM) and melt electrowriting (MEW) are techniques that use polymer fibers as building blocks for printing complex 3D structures, with fibers at the macroscopic and micrometer scale. Here, FDM and MEW are used to produce fibers of ...

We have fabricated new and robust nanostencil membranes for the surface patterning of 100-nm scale Al wires on full wafer scale. The stencil membranes are mechanically reinforced with corrugations, making them more stable against accumulated stress. The ap ...

Block copolymer inverse micelles from polystyrene-block-poly-2-vinylpyridine (PS-b-P2VP) deposited as monolayer films onto surfaces show responsive behavior and are reversibly switchable between two states of different topography and surface chemistry. The ...

In this paper we report on the effect of the environment on the SiO₂/pentacene interface. Two batches of bottom-contact pentacene thin-film transistors have been fabricated with a 100 nm thick SiO₂ as dielectric. Considerable shifts of the threshold voltag ...

Stencil Lithography has been used for the rapid and low cost fabrication of high resolution NIL stamps. The stamps are fabricated by Al deposition through a nanoscale shadow mask and subsequent Si etching. Features down to 50 nm in the stamps have been ach ...

In this paper, a two-dimensional nanometer scale tip-plate discharge model has been employed to study nanoscale electrical discharge in atmospheric conditions. The field strength distributions in a nanometer scale tip-to-plate electrode arrangement were ca ...

Photostructurable epoxy based resists, like SU-8, are soft materials with a Young's Modulus around 4 GPa, which makes them particularly suitable as base material to fabricate Atomic Force Microscopy (AFM) probes for non-destructive analysis of fragile samp ...

Magnetically-actuable, polymer-based variable optical attenuators (VOA) are presented in this paper. The design comprises a cantilever which also plays the role of a waveguide and the input/output alignment elements for simple alignment, yet still renderin ...

Jürgen Brugger

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Stencil assisted reactive ion etching for micro and nano patterning

Combining thermal scanning probe lithography and dry etching for grayscale nanopattern amplification

Application of stencil masks for ion beam lithographic patterning

Precision Surface Microtopography Regulates Cell Fate via Changes to Actomyosin Contractility and Nuclear Architecture

The systematic tunability of nanoparticle dimensions through the controlled loading of surface-deposited diblock copolymer micelles

Resistless Fabrication of Nanoimprint Lithography (NIL) Stamps Using Nano-Stencil Lithography

Design and optimization of nanogap array sensors

Harnessing the damping properties of materials for high-speed atomic force microscopy

Quick and Clean: Stencil Lithography for Wafer-Scale Fabrication of Superconducting Tunnel Junctions

Focused Ion Beam: A Versatile Technique for the Fabrication of Nano-Devices

Electrically conducting probes with full tungsten cantilever and tip for scanning probe applications

Performance Comparison of Shape Memory Polymer Structures Printed by Fused Deposition Modeling and Melt Electrowriting

Nanomechanical Mass Sensor for Spatially Resolved Ultrasensitive Monitoring of Deposition Rates in Stencil Lithography

Towards Reliable 100-Nanometer Scale Stencil Lithography on Full Wafer: Progress AND Challenges

Block copolymer micelles as switchable templates for nanofabrication

Pentacene - SiO2 interface: Role of the environment prior to pentacene deposition and its impact on TFT DC characteristics

Direct fabrication of NIL stamps using Stencil Lithography

Simulation of Electrical Discharge Initiated by a Nanometer-Sized Probe in Atmospheric Conditions

Stress and aging minimization in photoplastic AFM probes

Polymeric variable optical attenuators based on magnetic sensitive stimuli materials