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Patrik Willi Hoffmann

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Publications associées (42)

Chemical Vapor Deposition Kinetics and Localized Growth Regimes in Combinatorial Experiments

Patrik Willi Hoffmann, Estelle Wagner, Giacomo Benvenuti, Ali Dabirian, Yury Kuzminykh

Laser-assisted deposition: The discovery of chemical vapor deposition (CVD) conditions under which the growth rate is a decreasing function of the precursor flux has the potential to boost the resolution of laser-assisted CVD processes whereas flux- and de ...

2011

Combinatorial Discovery and Optimization of Amorphous HfO2-Nb2O5 Mixture with Improved Transparency

Paul Muralt, Patrik Willi Hoffmann, Estelle Wagner, Giacomo Benvenuti, Silviu Cosmin Sandu, Bamdad Afra, Ali Dabirian, Yury Kuzminykh, Scott Harada

Combinatorial high vacuum chemical vapor deposition (HV-CVD) of mixed HfO2-Nb2O5 thin films has been demonstrated to yield amorphous layers at substrate temperatures where individually deposited pure HfO2 and Nb2O5 films are polycrystalline. Spectroscopic ...

Electrochemical Society2010

Gas assisted focused electron beam induced etching of alumina

Patrik Willi Hoffmann, Tristan Bret, Bamdad Afra

This study investigates focused electron beam induced etching for the removal of alumina particles on patterned extreme ultra violet (EUV) mask using nitrosyl chloride (NOCl) as assist gas. As potential contaminant, particles of aluminum oxide (alumina, Al ...

2009

Determination of local refractive index variations in thin films by heterodyne interferometric scanning near-field optical microscopy

Patrik Willi Hoffmann, Giacomo Benvenuti, Maria-Pilar Bernal, Ali Dabirian, Yury Kuzminykh

We report on a heterodyne interferometric scanning near-field optical microscope developed for characterizing, at the nanometric scale, refractive index variations in thin films. An optical lateral resolution of 80 nm (lambda/19) and a precision smaller th ...

American Institute of Physics2009

Combination of Electron or Laser Beam Irradiation with High Vacuum Chemical Vapor Deposition (HV-CVD) of Al2O3 for in-situ Local Structuring on Wafer Scale Substrate

Patrik Willi Hoffmann, Xavier Multone, Yury Kuzminykh

A laser or electron beam assisted deposition in HV-CVD conditions was used in order to achieve structured amorphous alumina (Al2O3) deposits. Selective deposition of Al2O3 in the irradiated regions has been demonstrated. We investigate the influence of irr ...

ECS - The Electrochemical Society2009

Optimization of Ca Precursor Transport for High Vacuum Chemical Vapor Deposition (HV-CVD)

Patrik Willi Hoffmann, Yury Kuzminykh

2009

Method for recovering silicon from sawing waste

Patrik Willi Hoffmann

A method for separating and recovering silicon debris from sawing waste is characterized in that it comprises the following steps: - treating the sawing waste so as to deoxidize the silicon debris in a manner that reduces their surface energy, - applying t ...

2009

Gold nanoring arrays from responsive block copolymer templates

Patrik Willi Hoffmann, Raphaël Pugin, Li Wang, Franck Montagne

We report a pH-mediated synthetic route for the production of ordered and size-tuneable arrays of gold nanorings using responsive block copolymer micelles as templates. ...

Royal Society of Chemistry2009

Gas-assisted focused electron beam and ion beam processing and fabrication

Patrik Willi Hoffmann, Ivo Utke

Beams of electrons and ions are now fairly routinely focused to dimensions in the nanometer range. Since the beams can be used to locally alter material at the point where they are incident on a surface, they represent direct nanofabrication tools. The aut ...

2008

Two-dimensional electrostatic force field measurements with simultaneous topography measurement on embedded interdigitated nanoelectrodes using a force distance curve based method

Patrik Willi Hoffmann, Christian Santschi

Accurate simultaneous measurements on the topography and electrostatic force field of 500 nm pitch interdigitated electrodes embedded in a thin SiO2 layer in a plane perpendicular to the orientation of the electrodes are shown for the first time. A static ...

AIP American Institute of Physics2008

Near-field optical images of subwavelength annular aperture arrays exhibiting an extraordinary transmission

Patrik Willi Hoffmann, Christian Santschi

In this paper, we present near-field optical images of nanostructures exhibiting an extraordinary transmission. These structures consist of annular aperture arrays engraved in a metallic film: they are quite promising structures for nanophotonics because o ...

2008

Er-doped Al2O3 thin films deposited by high-vacuum chemical vapor deposition (HV-CVD)

Patrik Willi Hoffmann, Xavier Multone

Erbium-doped amorphous aluminum oxide layers deposited on Si or oxidized silicon substrates are promising construction pieces for future monolytic integrated optoelectronics devices. In a novel high-vacuum chemical vapor deposition setup the alumina films ...

2008

A Snake-Based Approach to Accurate Determination of Both Contact Points and Contact Angles

Patrik Willi Hoffmann, Daniel Sage, Gerit Kulik, Laura Barbieri

We present a new method based on B-spline snakes (active contours) for measuring high-accuracy contact angles. In this approach, we avoid making physical assumptions by defining the contour of the drop as a versatile B-spline curve. When useful, we extend ...

Elsevier2006

Easy release fluoropolymer molds for micro- and nano-pattern replication

Hans Jörg Mathieu, Patrik Willi Hoffmann, David Barbero

A mold (35) for use in nano- or micro-replication processes on thermoplastic polymer substrates (20), comprises a nano- or micro-structured fluoropolymer surface that, when the mold (35) is used in a nano- or micro-replication process, serves for the appli ...

2006

Interdigital 50 nm Ti Electrode Arrays Fabricated Using XeF2 Enhanced Focused Ion Beam Etching

Patrik Willi Hoffmann, Christian Santschi, Jürgen Brugger

The fabrication of interdigitated titanium nanoelectrode arrays of 50 nm in width and spacing is described in this work. The nanoarrays have been realized using a Ga+ focused ion beam (FIB). FIB milling is typically accompanied by redeposition of removed m ...

2006

Confining the sampling volume for Fluorescence Correlation Spectroscopy using a sub-wavelength sized aperture

Patrik Willi Hoffmann, Marcel Leutenegger, Alexandre Perentes, Theo Lasser, Olivier Martin

For the observation of single molecule dynamics with fluorescence fluctuation spectroscopy (FFS) very low fluorophore concentrations are necessary. For in vitro measurements, this requirement is easy to fulfill. In biology however, micromolar concentration ...

2006

Fabrication of arrays of sub-wavelength nano-apertures in an optically thick gold layer on glass slides for optical studies

Benjamin Dwir, Patrik Willi Hoffmann, Ivo Utke, Marcel Leutenegger, Alexandre Perentes, Theo Lasser

We report on the fabrication of two-dimensional arrays of nano-optical apertures in gold layers by electron beam lithography (EBL) on a transparent glass substrate. 30 x 30 μ m(2) large arrays of high aspect ratio sub-wavelength cylinders (400 nm diameter ...

2005

Submicrometer Hall devices fabricated by focused electron-beam-induced deposition

Radivoje Popovic, Giovanni Boero, Patrik Willi Hoffmann, Pavel Kejik, Niels Quack, Tristan Bret, Jürgen Brugger, Schahrazede-Lila Mouaziz

Hall devices having an active area of about (500 nm)(2) are fabricated by focused electron-beam-induced deposition. The deposited material consists of cobalt nanoparticles in a carbonaceous matrix. The realized devices have, at room temperature, a current ...

American Institute of Physics2005

Submicrometer Hall devices fabricated by focused electron-beam-induced deposition

Radivoje Popovic, Giovanni Boero, Patrik Willi Hoffmann, Pavel Kejik, Niels Quack, Tristan Bret, Jürgen Brugger, Schahrazede-Lila Mouaziz

Hall devices having an active area of about (500 nm)2 are fabricated by focused electron-beam-induced deposition. The deposited material consists of cobalt nanoparticles in a carbonaceous matrix. The realized devices have, at room temperature, a current se ...

2005

Beam-induced etching of material on substrate involves directing gaseous compound which reacts in the presence of beam to etch the excess material which not etching the substrate

Patrik Willi Hoffmann, Xavier Multone, Tristan Bret

A method and apparatus for local beam processing using a beam activated gas to etch material are described. Compounds are disclosed that are suitable for beam-induced etching. The invention is particularly suitable for electron beam induced etching of chro ...

FEI CO (FEIF-Non-standard)2005

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