Publication

Bringing NoCs to 65nm

Giovanni De Micheli, David Atienza Alonso, Luca Benini, Srinivasan Murali, Federico Angiolini, Antonio Pullini
2007
Journal Articles

Abstract

Very deep submicron process technologies are ideal application fields for NoCs, which offer a promising solution to the scalability problem. This article sheds light on the benefits and challenges of Noc-Based interconnect design in nanometer CMOS. The author present experimental results from fully working 65-NM Noc Designs and a detailed scalability analysis.

Official source

https://infoscience.epfl.ch/entities/publication/8a05aa2e-576a-4777-b006-d75fc1119c15

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Bringing NoCs to 65nm

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