Publications by Jürgen Brugger

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Resistless ion implantation of sub-micron scale features through nano-stencil ...

This paper presents drop-on-demand inkjet printing of SU-8 on functionalized surfaces for direct printing of computer controlled polymer patterns. The high viscosity of SU-8 required an in-depth investigation of the print parameters such as pulse amplitude ...

In this paper, we present the theoretical background, design, fabrication and characterization of a micromachined chamber assisting the fluidic self-assembly of micro-electro-mechanical systems in a bulk liquid. Exploiting bubble-induced acoustic microstre ...

The stencil mask diminishes thermal effects on alignment between stencil and substrate, and reduces the overall presence of a gap between stencil and substrate. In addition, this design allows for easy interchange of stencils, making local alterations of s ...

The fabrication of interdigitated titanium nanoelectrode arrays of 50 nm in width and spacing is described in this work. The nanoarrays have been realized using a Ga+ focused ion beam (FIB). FIB milling is typically accompanied by redeposition of removed m ...

Jürgen Brugger

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Resistless ion implantation of sub-micron scale features through nano-stencil

Very Large Scale Arrays of Chemo-Mechanical Nano-Switches for Ultralow Power Hydrogen Sensing

Minimized Blurring in Stencil Lithography using a Compliant Membrane

A portable microfluidic-based biophotonic sensor for extracellular H2O2 measurements

Stencil Lithography: Quick and Clean

Nanopatterned Self-Assembled Monolayers by Using Diblock Copolymer Micelles as Nanometer-Scale Adsorption and Etch Masks

Drop-On-Demand Inkjet Printing of SU-8 Polymer

Acousto-fluidic system assisting in-liquid self-assembly of microcomponents

Thermal control extends heated stencil’s life-time

Preface: Special Issue: Euromat 2011-European Congress and Exhibition on Advanced Materials and Processes: Symposium A53 MEMS/NEMS for Sensorial and Actorial Materials

UV-patternable polymers with selective spectral response (vol 98, pg 234, 2013)

Stencil mask for accurate pattern replication

Interdigital 50 nm Ti Electrode Arrays Fabricated Using XeF2 Enhanced Focused Ion Beam Etching

Capteur pour la detection d'hydrogene et procede de fabrication d'un tel capteur

Direct Etching of High Aspect structures through a Stencil

Magnetic Nanocrystals Modified Epoxy Photoresist for fabrication of NEMS and MEMS

Special Issue of the Eurosensors XXIII conference Preface

Large-Area Gold/Parylene Plasmonic Nanostructures Fabricated by Direct Nanocutting

Etching of sub-micrometer structures through Stencil

Quick & Clean: Advances in High Resolution Stencil Lithography