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Jürgen Brugger

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Related publications (329)

Towards Reliable 100-Nanometer Scale Stencil Lithography on Full Wafer: Progress AND Challenges

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Oscar Vazquez Mena

We have fabricated new and robust nanostencil membranes for the surface patterning of 100-nm scale Al wires on full wafer scale. The stencil membranes are mechanically reinforced with corrugations, making them more stable against accumulated stress. The ap ...

IEEE2007

Stencil mask for accurate pattern replication

Jürgen Brugger

The stencil mask diminishes thermal effects on alignment between stencil and substrate, and reduces the overall presence of a gap between stencil and substrate. In addition, this design allows for easy interchange of stencils, making local alterations of s ...

2007

Permalloy thin films exchange coupled to arrays of cobalt islands

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

Periodic arrays of elongated cobalt islands exchange coupled to continuous Permalloy thin films were fabricated using silicon nitride stencil masks and the magnetic spin configurations during magnetization reversal were studied with photoemission electron ...

AIP American Institute of Physics2006

Cell Membranes Suspended Across Nanoaperture Arrays

Jean-Baptiste Perez, Horst Vogel, Christian Santschi, Jürgen Brugger, Christophe Danelon

The authors present a method for spreading large (> 100 mm2) cell membrane fragments across nanoapertures in planar supports. Electron-beam and focused-ion-beam lithog. were used to fabricate arrays of 50-600 nm diam. holes in free-standing silicon nitride ...

2006

Fabrication of metallic patterns by microstencil lithography on polymer surfaces suitable as microelectrodes in integrated microfluidic systems

Jürgen Brugger, Nao Takano, Marc Antonius Friedrich van den Boogaart, Helmut Knapp

Microstencil lithography, i.e. local deposition of micrometer scale patterns through small shadow masks, is a promising method for metal micropattern definition on polymer substrates that cannot be structured using organic-solvent-based photoresist technol ...

2006

Silicon Supported Membranes for Improved Large-Area and High-Density Micro/Nanostencil Lithography

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

In this paper, the fabrication and use of stencils for full-wafer scale shadow mask (stencil) lithography is described. The stencils fabricated via microelectromechanical systems are mechanically stabilized and show clearly reduced stress-induced membrane ...

Institute of Electrical and Electronics Engineers2006

Surface Micromachining of Polyureasilazane Based Ceramic-MEMS using SU-8 Micromolds

Vahid Fakhfouri, Sébastien Jiguet, Jürgen Brugger

We describe a novel surface micromachining process for the fabrication of ceramic-type MEMS devices, such as free-standing cantilevers, that is based on the use of high-aspect ratio micromolds of SU8 and aluminum as sacrificial layer. 250μm-high and 100-10 ...

2006

Micro- and nanostructured devices for investigating biomolecular interactions

Jean-Baptiste Perez, Horst Vogel, Christian Santschi, Christoph Schreiter, Jürgen Brugger, Christophe Danelon

Cell membrane receptors and ion channels are essential in many different cellular processes. To analyse the activity of membrane proteins in vesicles and biological cells, we fabricated micro- nanostructured chips, enabling the application of electrophysio ...

2006

Fabrication and functionalization of nanochannels by electron-beam-induced silicon oxide deposition

Horst Vogel, Christian Santschi, Jürgen Brugger, Christophe Danelon

We report on the fabrication and electrical characterization of functionalized solid-state nanopores in low stress silicon nitride membranes. First, a pore of approximately 50 nm diameter was drilled using a focused ion beam technique, followed by the loca ...

2006

Photoluminescence characterization of few-nanocrystals electronic devices

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

Photoluminescence (PL) spectroscopy is demonstrated as a suitable technique to characterize silicon nanocrystals (Si-NCs)-based nonvolatile memory devices. The 2D array of Si-NCs forming the floating gate is obtained by low-energy ion implantation in thin ...

2006

Tuning the Dimensions and Periodicities of Nanostructures Starting from the Same Polystyrene-block-poly(2-vinylpyridine) Diblock Copolymer

Jürgen Brugger, Harry Heinzelmann, Sivashankar Krishnamoorthy, Raphaël Pugin

The controlled tuning of the characteristic dimensions of two-dimensional arrays of block-copolymer reverse micelles deposited on silicon surfaces is demonstrated. The polymer used is polystyrene-block-poly(2-vinylpyridine) (91500-b-105000 g mol–1). Revers ...

2006

Full wafer integration of NEMS on CMOS by nanostencil lithography

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

Wafer scale nanostencil lithography is used to define 200 nm scale mechanically resonating silicon cantilevers monolithically integrated into CMOS circuits. We demonstrate the simultaneous patterning of ~2000 nanodevices by post-processing standard CMOS wa ...

2006

Corrugated membranes for improved pattern definition with micro/nanostencil lithography

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

We present a MEMS process for the fabrication of arbitrary (adaptable to specific aperture geometries) stabilization of silicon nitride membranes to be used as miniature shadow masks or (nano) stencils. Stabilization was realized by the fabrication of sili ...

2006

Polymer-based cantilevers with integrated electrodes

Radivoje Popovic, Giovanni Boero, Jürgen Brugger, Schahrazede-Lila Mouaziz

An innovative release method of polymer cantilevers with embedded integrated metal electrodes is presented. The fabrication is based on the lithographic patterning of the electrode layout on a wafer surface, covered by two layers of SU-8 polymer: a 10-um-t ...

Institute of Electrical and Electronics Engineers2006

Combined Al-protection and HF-vapor release process for ultrathin single crystal silicon cantilevers

Giovanni Boero, Jürgen Brugger, Schahrazede-Lila Mouaziz

A new technology based on a combination of Al-protection layers and HF-vapor etching to produce ultrathin single crystal silicon cantilevers is presented. 500 um long, 10 um wide and 0.5 um thick cantilevers have been fabricated with a high yield. A resona ...

2006

Electrically conducting probes with full tungsten cantilever and tip for scanning probe applications

Andrzej Kulik, Giovanni Boero, Florian Calame, Jürgen Brugger, Johannes Steen, Kyumin Lee

We have developed a new hybrid AFM probe combining an SU-8 polymer body with a full tungsten cantilever having a nanometric tip. The fabrication is based on surface micromachining a silicon wafer, where tungsten is sputter deposited in oxidation sharpened ...

2006

Reverse transfer of nanostencil patterns using intermediate sacrificial layer and lift-off process

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Oscar Vazquez Mena

We propose a new process by which patterns produced by nanostencil lithography can be reversed, so that the final pattern on the substrate has the same contrast (filled or empty) as that of the stencil. In this process, the stencil pattern is first formed ...

2006

Interdigital 50 nm Ti Electrode Arrays Fabricated Using XeF2 Enhanced Focused Ion Beam Etching

Patrik Willi Hoffmann, Christian Santschi, Jürgen Brugger

The fabrication of interdigitated titanium nanoelectrode arrays of 50 nm in width and spacing is described in this work. The nanoarrays have been realized using a Ga+ focused ion beam (FIB). FIB milling is typically accompanied by redeposition of removed m ...

2006

Block copolymer micelles as switchable templates for nanofabrication

Jürgen Brugger, Harry Heinzelmann, Sivashankar Krishnamoorthy, Raphaël Pugin

Block copolymer inverse micelles from polystyrene-block-poly-2-vinylpyridine (PS-b-P2VP) deposited as monolayer films onto surfaces show responsive behavior and are reversibly switchable between two states of different topography and surface chemistry. The ...

2006

Formation of Metal Nano- and Micro-patterns on Self-Assembled Monolayers Using Pulsed Laser Deposition through Nanostencils and Electroless Deposition

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

Patterns of noble-metal structures on top of self-assembled monolayers (SAMs) on Au and SiO2 substrates have been prepared following two approaches. The first approach consists of pulsed laser deposition (PLD) of Pt, Pd, Au, or Cu through nano- and microst ...

2006

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