Publication

Stencil mask for accurate pattern replication

Jürgen Brugger
2007
Patents

Abstract

The stencil mask diminishes thermal effects on alignment between stencil and substrate, and reduces the overall presence of a gap between stencil and substrate. In addition, this design allows for easy interchange of stencils, making local alterations of stencil apertures possible without the necessity for the fabrication of a completely new stencil.

Official source

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