Home

Person

Jürgen Brugger

About
Privacy
Disclaimer

Graph Chatbot

Related publications (329)

Drop-on-demand Ink-jet printing of functional materials: Case studies of SU-8 and NCs-embedded Polymer nanocomposites

Vahid Fakhfouri, Jürgen Brugger, Joo Yeon Kim

2008

Etching of sub-micrometer structures through Stencil

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Kristopher Pataky, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo

Resistless processes to realize the pattern transfer of your designs into the substrate present some advantages, as the reduction in fabrication steps. Stencil Lithography (SL) is one of the most used resistless processes and, up to now, it has mainly been ...

2008

Tunable, high aspect ratio pillars on diverse substrates using copolymer micelle lithography: an interesting platform for applications

Cyrille Hibert, Jürgen Brugger, Sivashankar Krishnamoorthy

We demonstrate the use of copolymer micelle lithography using polystyrene-block-poly(2-vinylpyridine) reverse micelle thin films in their as-coated form to create nanopillars with tunable dimensions and spacing, on different substrates such as silicon, sil ...

2008

Reusability of nanostencils for the patterning of Aluminum nanostructures by selective wet etching

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Oscar Vazquez Mena, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo

One of the major advantages of stencil lithography is the possibility to use stencils many times. However, when stencils contain nanoapertures, the clogging of the membranes limits the useful life time of the stencils. The clogging is due to the accumulati ...

Elsevier2008

The systematic tunability of nanoparticle dimensions through the controlled loading of surface-deposited diblock copolymer micelles

Jürgen Brugger, Harry Heinzelmann, Sivashankar Krishnamoorthy, Raphaël Pugin

The continuous tunability of iron oxide nanoparticle dimensions is demonstrated using the pH controlled loading of ferric nitrate from aqueous solution into polystyrene–block–polyacrylic acid reverse micelles deposited on a silicon substrate. Quasi-hexagon ...

2008

Nanopatterned Self-Assembled Monolayers by Using Diblock Copolymer Micelles as Nanometer-Scale Adsorption and Etch Masks

Jürgen Brugger, Harry Heinzelmann, Sivashankar Krishnamoorthy, Raphaël Pugin

Wiley2008

Stress and aging minimization in photoplastic AFM probes

Jürgen Brugger, Luis Guillermo Villanueva Torrijo

Photostructurable epoxy based resists, like SU-8, are soft materials with a Young's Modulus around 4 GPa, which makes them particularly suitable as base material to fabricate Atomic Force Microscopy (AFM) probes for non-destructive analysis of fragile samp ...

2008

Resistivity Measurements of Gold Wires Fabricated by Stencil Lithography on Flexible Polymer Substrates

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo

We report on the patterning and characterization of titanium–gold (Ti–Au) wire test structures on polyethylene naphthalate (PEN), polyethylene terephthalate (PET) and polyimide (PI) substrates. PEN, PET and PI are flexible polymers which can withstand stre ...

Elsevier2008

Inkjet printing of SU-8 for polymer-based MEMS a case study for microlenses

Vahid Fakhfouri, Jürgen Brugger, Edoardo Charbon, Grégory Mermoud, Joo Yeon Kim

This paper describes a novel method to fabricate polymer MEMS based on the inkjet printing of SU-8, with a special emphasis on integrated micro-optical lens arrays. Inkjet control parameters are optimized in order to enable a stable and reproducible ejecti ...

IEEE2008

Sub-100 nm-scale Aluminum Nanowires by Stencil Lithography: Fabrication and Characterization

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo

We present the fabrication process and electrical characterization of sub-100 nm scale Al nanowires (NWs) fabricated by stencil lithography (SL). We use a stencil with sub- 100 nm wide nanoslits patterned by focused ion beam (FIB) milling. The stencil is a ...

2008

Etching of sub-micrometer structures through Stencil

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo

Elsevier2008

Dynamic Stencil Lithography on Full Wafer Scale

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Andreea Veronica Savu

2008

Dynamic stencil lithography on full wafer scale

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Andreea Veronica Savu

In this paper, the authors present a breakthrough extension of the stencil lithography tool and method. In the standard stencil lithography static mode, material is deposited through apertures in a membrane (stencil) on a substrate which is clamped to the ...

2008

KFM detection of quantified charges injected into a thin SiO2 layer containing Si nps embedded by ultra low energy ion implantation using stencil lithography

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Andreea Veronica Savu

2008

The gas flow rate increase obtained by an oscillating piezoelectric actuator on a micronozzle

Jürgen Brugger

Micronozzles with piezoelectric actuator were fabricated and investigated. The micronozzles were fabricated in glass substrates using a powderblasting technique, and the actuator is a bimorph structure made from a piezoelectric polymer. The actuator was lo ...

2008

Silicon nanoparticles synthesized in SiO2 pockets by stencil-masked low energy ion implantation and thermal annealing

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

We propose an original approach called a "stencil-masked ion implantation process" for performing a spatially localized synthesis of a limited number of Si nanocrystals within a thin SiO2 layer. In this process, the SiO2 layer is irradiated with 1 keV sili ...

Elsevier2008

Two-dimensional magnetic resonance force microscopy using full-volume Fourier and Hadamard encoding

Giovanni Boero, Jürgen Brugger, Schahrazede-Lila Mouaziz

A rapid acquisition method for two-dimensional (2D) magnetic resonance force microscopy images is described. Spatial resolution is based on gradients in the static magnetic field B0 and in the applied radiofrequency field B1. Hadamard- and Fourier-encoding ...

2008

A single nanotrench in a palladium microwire for hydrogen detection

Jürgen Brugger, Oscar Vazquez Mena, Thomas Kiefer, Luis Guillermo Villanueva Torrijo

The hydrogen sensing characteristics of a single nanotrench fabricated by focused ion beam milling (FIB) in an evaporated palladium microwire are presented. In situ atomic force microscopy (AFM) measurements proved that, in the presence of H2, the trench c ...

2008

Controlled synthesis of silicon nanocrystals into a thin SiO2 layer synthesized by stencil-masked ultra-low energy ion implantation

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

2008

Design and optimization of nanogap array sensors

Jürgen Brugger, Thomas Kiefer, Luis Guillermo Villanueva Torrijo

We present a percolation based model which is suitable for the design of sensors based on highly ordered nanogap arrays. Monte-Carlo simulations and analytical expressions are used to calculate the sensitivity and dynamic range as a function of the topolog ...

2008

Page 14 of 17