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Jürgen Brugger

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Related publications (329)

SiN membranes with submicrometer hole arrays patterned by wafer-scale nanosphere lithography

Jürgen Brugger, Nicolas Blondiaux, Harry Heinzelmann, Oscar Vazquez Mena, Andreea Veronica Savu, Mona Julia Katharina Klein, Raphaël Pugin, Franck Montagne

In this work, nanosphere lithography was integrated with standard microfabrication for the wafer-scale fabrication of silicon nitride (SiN) membranes with arrays of submicrometer holes. A monolayer of polystyrene (PS) beads with a mean diameter of 428 or 5 ...

2011

Ultra-low power palladium-coated MEMS resonators for hydrogen detection under ambient conditions

Jürgen Brugger, Luis Guillermo Villanueva Torrijo, Jonas Gustav Henriksson

We present a novel approach for hydrogen gas detection, based on palladium-coated micromechanical resonators. A sequence of thin film technniques allows the large-scale parallel fabrication of free-standing beams separated from a counter-electrode by a mes ...

IEEE2011

Robust PECVD SiC membrane made for stencil lithography

Jürgen Brugger, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Shenqi Xie, Wei Tang

Stencil lithography (SL) is a shadow mask technique which allows parallel, resistless, micro- and nano- patterning of material through apertures created in a membrane (stencil) onto a substrate. The stencils are usually made of LPCVD low-stress SiN due to ...

Elsevier2011

Hybrid polymer microlens arrays with high numerical apertures fabricated using simple ink-jet printing technique

Vahid Fakhfouri, Dmitri Boiko, Jürgen Brugger, Edoardo Charbon, Nils Benedict Brauer, Joo Yeon Kim

Microlens arrays fabricated by a direct ink-jet printing of UV-curable hybrid polymer are reported. A periodic pattern of polymer drops was ink-jet printed on the surface-treated glass substrate and cured in the UV-light. Using this simple technique, we de ...

2011

Solid-state Nanopore Array Membranes Patterned by Electron Beam Lithography, Nanosphere Lithography and Aluminum Anodization

Jürgen Brugger, Nicolas Blondiaux, Oscar Vazquez Mena, Andreea Veronica Savu, Mona Julia Katharina Klein, Franck Montagne, Vaida Auzelyte, Songmei Wu

We present the fabrication of thin membranes with dense arrays of nanometer and submicrometer pore arrays by the integration of standard micromachining with three pore patterning techniques: electron beam lithography (EBL), nanosphere lithography (NSL) and ...

Research Publishing Services2011

Solid-state nanopore array membranes patterned by electron beam lithography, nanosphere lithography and aluminum anodization

Jürgen Brugger, Nicolas Blondiaux, Harry Heinzelmann, Oscar Vazquez Mena, Andreea Veronica Savu, Mona Julia Katharina Klein, Raphaël Pugin, Franck Montagne, Vaida Auzelyte, Songmei Wu

2011

Localized Ion Implantation Through Micro/Nanostencil Masks

Philippe Langlet, Jürgen Brugger, Oscar Vazquez Mena, Luis Guillermo Villanueva Torrijo, Cristina Martin Olmos

A method is presented that allows the deﬁnition of micrometer- and submicrometer-sized implanted structures in silicon without using photoresist patterning. The process is based on the use of stencils as masks in a conventional ion implanter, and is tested ...

Institute of Electrical and Electronics Engineers2011

Ambipolar silicon nanowire FETs with stenciled-deposited metal gate

Yusuf Leblebici, Jürgen Brugger, Giovanni De Micheli, Andreea Veronica Savu, Davide Sacchetto

We report on a fully CMOS compatible fabrication method for ambipolar silicon nanowire FinFETs. The low thermal budget processing, compatible with monolithic 3D device integration, makes use of low pressure chemical vapor deposition (LPCVD) of amorphous Si ...

Elsevier2011

The effects of channel length and film microstructure on the performance of pentacene transistors

Libero Zuppiroli, Jürgen Brugger, Katrin Sidler Arnet, Andreea Veronica Savu, Franziska Dora Fleischli

With the use of the stencil lithography, we fabricated pentacene thin-ﬁlm transistors pre- pared directly on thermally oxidized silicon gates with channel lengths ranging from 2 to 600 lm. By performing 4-probe measurements or by using the transfer line me ...

Elsevier2011

Characterization of Hydrophobic Forces for in Liquid Self-Assembly of Micron-Sized Functional Building Blocks

Laure Aeschimann, Jürgen Brugger, Loïc Jacot-Descombes, Rosario Maurizio Gullo

This paper presents the experimental and numerical study of hydrophobic interaction forces at nanometer scale in the scope of engineering micron-sized building blocks for self-assembly in liquid. The hydrophobic force distance relation of carbon, Teflon an ...

2011 Materials Research Society2011

Vertically-Stacked Si Nanowire FETs with sub-micrometer Gate-All-Around polysilicon gates patterned by nanostencil lithography

Yusuf Leblebici, Jürgen Brugger, Giovanni De Micheli, Michail Zervas, Andreea Veronica Savu, Davide Sacchetto, Shenqi Xie

2011

Robust PECVD SiC membrane made for stencil lithography

Jürgen Brugger, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Shenqi Xie, Wei Tang

Stencil lithography (SL) is a shadow mask based technique which allows parallel, resistless, micro- and nano-patterning of material through apertures in a membrane (stencil) onto a substrate [1]. The stencils are usually made of LPCVD low-stress SiN due to ...

Microelectronic Engineering2011

Link between Alginate Reaction Front Propagation and General Reaction Diffusion Theory

Philippe Renaud, Jürgen Brugger, Thomas Michael Braschler, Kristopher Pataky, Ana Valero, Ludovica Colella

We provide a common theoretical framework reuniting specific models for the Ca2+-alginate system and general reaction diffusion theory along with experimental validation on a microfluidic chip. As a starting point, we use a set of nonlinear, partial differ ...

2011

Microlenses with defined contour shapes

Jürgen Brugger, Loïc Jacot-Descombes, Victor Javier Cadarso Busto

Ink-jet printing of optical ink over SU-8 pillars is here proposed as a technology for obtaining microlenses with shape control. To demonstrate the flexibility of this method, microlenses with five different contour shapes (ranging from circular and ellipt ...

Optical Society of America2011

Containers assembled in fluid and corresponding production

Alcherio Martinoli, Jürgen Brugger, Grégory Mermoud, Cristina Martin Olmos

A method for fabricating a fluid container, wherein at least two half containers are mated in said fluid to be contained in said container. This method allows the incorporation of prefabricated devices into each half containers as well as the functional co ...

2011

Reliable and Improved Nanoscale Stencil Lithography by Membrane Stabilization, Blurring and Clogging Corrections

Jürgen Brugger, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo

The reliable and reproducible fabrication of nanostructures by stencil lithography faces three main challenges: the stability of the thin stencil membranes with nanoapertures, the blurring of the deposited structures, and the clogging of the nanoapertures ...

2011

GOLD MEMBRANES WITH LARGE ARRAYS OF SUB-µm HOLES FABRICATED BY WAFER-SCALE NANOSPHERE LITHOGRAPHY

Jürgen Brugger, Harry Heinzelmann, Mona Julia Katharina Klein, Raphaël Pugin

Gold membranes with large arrays of sub-µm holes were fabricated and optically characterized. The fabrication is a combination of a bottom-up, self-assembly based patterning technique, Nanosphere Lithography (NSL), and standard microfabrication. This was a ...

2011

100 mm dynamic stencils pattern sub-micrometre structures

Jürgen Brugger, Andreea Veronica Savu, Shenqi Xie

Dynamic stencil lithography uses a moving shadow-mask to draw patterns by having directionally evaporated material deposited through the stencil apertures onto the substrate. Sub-micrometre, two- dimensional patterning is demonstrated at full 100 mm wafer ...

2011

Metallic Nanodot Arrays by Stencil Lithography for Plasmonic Biosensing Applications

Jürgen Brugger, Oscar Vazquez Mena, Luis Guillermo Villanueva Torrijo

The fabrication of gold nanodots by stencil lithography and its application for optical biosensing based on localized surface plasmon resonance are presented. Arrays of 50−200 nm wide nanodots with different spacing of 50−300 nm are fabricated without any ...

American Chemical Society2011

Collimator

Jürgen Brugger, Kristopher Pataky

The present invention is directed to a collimator that comprises grooves or channels in the submicrometer to micrometer range. The present invention is also related to uses of a collimator and collimator holder as described herein as well as apparatuses co ...

2010

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