Publications by Giacomo Benvenuti

Related publications (7)

Chemical beam deposition of titanium dioxide thin films

Titanium dioxide (TiO2) is a widely investigated material for its biological compatibility, high dielectric constant and refractive index, chemical and mechanical resistance, and catalytic activity. Several different techniques are available to produce TiO ...

EPFL2003

Evaluation of niobium dimethylamino-ethoxide for chemical vapour deposition of niobium oxide thin films

Patrik Willi Hoffmann, Ali Dabirian, Giacomo Benvenuti, Estelle Wagner, Yury Kuzminykh

Chemical vapour deposition (CVD) processes depend on the availability of suitable precursors. Precursors that deliver a stable vapour pressure are favourable in classical CVD processes, as they ensure process reproducibility. In high vacuum CVD (HV-CVD) pr ...

Elsevier2014

A combinatorial chemical beam vapour deposition approach to tune the electrical conductivity of Nb:TiO2 films via Si co-doping

Paul Muralt, Silviu Cosmin Sandu, Giacomo Benvenuti, Estelle Wagner, Scott Harada

Chemical beam vapour deposition (CBVD) is a thin film deposition technique operated under high vacuum conditions in which film growth occurs through the thermally activated chemical decomposition of precursor molecules at the substrate surface. This techni ...

Elsevier Science Sa2016

Chemical Vapor Deposition Kinetics and Localized Growth Regimes in Combinatorial Experiments

Patrik Willi Hoffmann, Ali Dabirian, Giacomo Benvenuti, Estelle Wagner, Yury Kuzminykh

Laser-assisted deposition: The discovery of chemical vapor deposition (CVD) conditions under which the growth rate is a decreasing function of the precursor flux has the potential to boost the resolution of laser-assisted CVD processes whereas flux- and de ...

2011

Fabrication of complex oxide microstructures by combinatorial chemical beam vapour deposition through stencil masks

Paul Muralt, Andreea Veronica Savu, Silviu Cosmin Sandu, Giacomo Benvenuti, Estelle Wagner, Scott Harada

Chemical Beam Vapour Deposition is a gas phase deposition technique, operated under high vacuum conditions, in which evaporated chemical precursors are thermally decomposed on heated substrates to form a film. In the particular equipment used in this work, ...

Elsevier2015

Combinatorial Discovery and Optimization of Amorphous HfO2-Nb2O5 Mixture with Improved Transparency

Paul Muralt, Patrik Willi Hoffmann, Silviu Cosmin Sandu, Ali Dabirian, Giacomo Benvenuti, Estelle Wagner, Yury Kuzminykh, Scott Harada

Combinatorial high vacuum chemical vapor deposition (HV-CVD) of mixed HfO2-Nb2O5 thin films has been demonstrated to yield amorphous layers at substrate temperatures where individually deposited pure HfO2 and Nb2O5 films are polycrystalline. Spectroscopic ...

Electrochemical Society2010

Determination of local refractive index variations in thin films by heterodyne interferometric scanning near-field optical microscopy

Patrik Willi Hoffmann, Ali Dabirian, Giacomo Benvenuti, Yury Kuzminykh

We report on a heterodyne interferometric scanning near-field optical microscope developed for characterizing, at the nanometric scale, refractive index variations in thin films. An optical lateral resolution of 80 nm (lambda/19) and a precision smaller th ...

American Institute of Physics2009