Publication

Chemical Vapor Deposition Kinetics and Localized Growth Regimes in Combinatorial Experiments

Patrik Willi Hoffmann, Ali Dabirian, Giacomo Benvenuti, Yury Kuzminykh
2011
Journal Articles

Abstract

Laser-assisted deposition: The discovery of chemical vapor deposition (CVD) conditions under which the growth rate is a decreasing function of the precursor flux has the potential to boost the resolution of laser-assisted CVD processes whereas flux- and desorption-limited conditions appear to be the ideal environment for spatially addressable combinatorial experiments (see picture). Copyright © 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Official source

https://infoscience.epfl.ch/entities/publication/dcec378f-30c7-4195-abef-67faed355678

About this result

This page is automatically generated and may contain information that is not correct, complete, up-to-date, or relevant to your search query. The same applies to every other page on this website. Please make sure to verify the information with EPFL's official sources.

Graph Chat

Chat with Graph Search

Ask any question about EPFL courses, lectures, exercises, research, news, etc. or try the example questions below.

DISCLAIMER: The Graph Chatbot is not programmed to provide explicit or categorical answers to your questions. Rather, it transforms your questions into API requests that are distributed across the various IT services officially administered by EPFL. Its purpose is solely to collect and recommend relevant references to content that you can explore to help you answer your questions.

Chemical Vapor Deposition Kinetics and Localized Growth Regimes in Combinatorial Experiments

Chat with Graph Search

Optimizing Atomic Layer Deposition Processes with Nanowire-Assisted TEM Analysis

Piezoelectric and elastic properties of Al0.60Sc0.40N thin films deposited on patterned metal electrodes

Font Side Solutions for c-Si Solar Cells with High-Temperature Passivating Contacts