Lecture

Focused Ion Beam: Principles and Applications

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In course

MSE-636: Organic semiconductors

Description

This lecture covers the principles and applications of Focused Ion Beam (FIB) technology, including ion-solid interactions, FIB imaging, milling, deposition, and TEM sample preparation. It explains the advantages of using ions over electrons, the structure of FIB ion columns, and why Gallium is commonly used. The lecture also discusses the three basic operating modes of FIB, such as sputtering, deposition, and etching, along with the various effects of ion-solid interactions.

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Instructor

Frank Nüesch

Teaching & PhD PhD Students Elodie Didier, Ceren Mitmit, João Pedro Ferreira Assunção, Vahid Charkhesht Past EPFL PhD Students Hui Zhang, Simon Johannes Dünki, Yee Song Ko, Lei Wang, Sandra Christina Jenatsch, Nicolas Alexandre Serge Leclaire, Donatas Gesevicius, Surendra Babu Anantharaman, Markus Regnat, Philip Horst Caspari, Patrik Schürch, David Reber, Karen Verena Strassel, Sina Abdolhosseinzadeh, Matthias Diethelm, Francis Owusu, Camilla Arietta Vael-Garn, Yeerlan Adeli, Wei-Hsu Hu, Cansu Zeytun Kara

Official source

Related concepts (20)

Focused ion beam

Focused ion beam, also known as FIB, is a technique used particularly in the semiconductor industry, materials science and increasingly in the biological field for site-specific analysis, deposition, and ablation of materials. A FIB setup is a scientific instrument that resembles a scanning electron microscope (SEM). However, while the SEM uses a focused beam of electrons to image the sample in the chamber, a FIB setup uses a focused beam of ions instead.

Ion beam

An ion beam is a type of charged particle beam consisting of ions. Ion beams have many uses in electronics manufacturing (principally ion implantation) and other industries. A variety of ion beam sources exists, some derived from the mercury vapor thrusters developed by NASA in the 1960s. The most common ion beams are of singly-charged ions. Ion current density is typically measured in mA/cm^2, and ion energy in eV.

Ion source

An ion source is a device that creates atomic and molecular ions. Ion sources are used to form ions for mass spectrometers, optical emission spectrometers, particle accelerators, ion implanters and ion engines. Electron ionization Electron ionization is widely used in mass spectrometry, particularly for organic molecules. The gas phase reaction producing electron ionization is M{} + e^- -> M^{+\bullet}{} + 2e^- where M is the atom or molecule being ionized, e^- is the electron, and M^{+\bullet} is the resulting ion.

Secondary ion mass spectrometry

Secondary-ion mass spectrometry (SIMS) is a technique used to analyze the composition of solid surfaces and thin films by sputtering the surface of the specimen with a focused primary ion beam and collecting and analyzing ejected secondary ions. The mass/charge ratios of these secondary ions are measured with a mass spectrometer to determine the elemental, isotopic, or molecular composition of the surface to a depth of 1 to 2 nm.

Vacuum deposition

Vacuum deposition , also known as vacuum coating or thin-film deposition, is a group of processes used to deposit layers of material atom-by-atom or molecule-by-molecule on a solid surface. These processes operate at pressures well below atmospheric pressure (i.e., vacuum). The deposited layers can range from a thickness of one atom up to millimeters, forming freestanding structures. Multiple layers of different materials can be used, for example to form optical coatings.

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Related concepts (20)

Focused ion beam

Ion beam

Ion source

Secondary ion mass spectrometry

Vacuum deposition