Lecture

Industrial Plasmas: Sheath Formation and Plasma Etching

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In course

PHYS-424: Plasma II

This course completes the knowledge in plasma physics that students have acquired in the previous two courses, with a discussion of different applications, in the fields of magnetic confinement and controlled fusion, astrophysical and space plasmas, and so ...

Description

This lecture covers the formation of sheaths in industrial plasmas, discussing the transition between plasma and walls, the directional ion flux for plasma etching, and the importance of sheath properties for integrated circuit manufacturing. It also explores the use of DC and AC currents in plasma processing, the Bohm criterion for ion velocity, and the ion bombardment energy. The lecture concludes with insights into large-area RF reactors for electronics production and plasma-enhanced chemical vapor deposition of thin film silicon.

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Instructor

Holger Reimerdes

Teaching & PhD PhD Students Martim Zurita, Marta Pedrini, Benjamin Yong Kwak Brown, Pierre Louis Sintre, Massimo Carpita, Richard Alexander David Ducker, Giuseppe Iunior Drago Past EPFL PhD Students Mirko Wensing, Claudia Colandrea, Guang-Yu Sun Past EPFL PhD Students as codirector Gustavo Paganini Canal, Joyeeta Sinha, Roberto Maurizio Courses Control and Operation of Tokamaks PHYS-748 This course treats the main issues in operation and control of a tokamak. Control-oriented models are de

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Related concepts (32)

Plasma (physics)

Plasma () is one of four fundamental states of matter, characterized by the presence of a significant portion of charged particles in any combination of ions or electrons. It is the most abundant form of ordinary matter in the universe, being mostly associated with stars, including the Sun. Extending to the rarefied intracluster medium and possibly to intergalactic regions, plasma can be artificially generated by heating a neutral gas or subjecting it to a strong electromagnetic field.

War of the currents

The war of the currents was a series of events surrounding the introduction of competing electric power transmission systems in the late 1880s and early 1890s. It grew out of two lighting systems developed in the late 1870s and early 1880s; arc lamp street lighting running on high-voltage alternating current (AC), and large-scale low-voltage direct current (DC) indoor incandescent lighting being marketed by Thomas Edison's company.

Direct current

Direct current (DC) is one-directional flow of electric charge. An electrochemical cell is a prime example of DC power. Direct current may flow through a conductor such as a wire, but can also flow through semiconductors, insulators, or even through a vacuum as in electron or ion beams. The electric current flows in a constant direction, distinguishing it from alternating current (AC). A term formerly used for this type of current was galvanic current.

Thin-film solar cell

Thin-film solar cells are made by depositing one or more thin layers (thin films or TFs) of photovoltaic material onto a substrate, such as glass, plastic or metal. Thin-film solar cells are typically a few nanometers (nm) to a few microns (μm) thick–much thinner than the wafers used in conventional crystalline silicon (c-Si) based solar cells, which can be up to 200 μm thick. Thin-film solar cells are commercially used in several technologies, including cadmium telluride (CdTe), copper indium gallium diselenide (CIGS), and amorphous thin-film silicon (a-Si, TF-Si).

Amorphous silicon

Amorphous silicon (a-Si) is the non-crystalline form of silicon used for solar cells and thin-film transistors in LCDs. Used as semiconductor material for a-Si solar cells, or thin-film silicon solar cells, it is deposited in thin films onto a variety of flexible substrates, such as glass, metal and plastic. Amorphous silicon cells generally feature low efficiency.

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