Publication

Patterning of parallel nanobridge structures by reverse nanostencil lithography using an edge-patterned stencil

Publications associées (26)

Monolithic Fabrication of Silicon Nanowires Bridging Thick Silicon Structures

Yusuf Leblebici, Oliver Peric, Davide Sacchetto, Zuhal Tasdemir

A monolithic process is developed for the fabrication of Si nanowires within thick Si substrates. A combination of anisotropic etch and sidewall passivation is utilized to protect and release Si lines during the subsequent deep etch. An etch depth of 10 mu ...

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC2018

Printing sub-micron structures using Talbot mask-aligner lithography with a 193 nm CW laser light source

Wilfried Noell, Toralf Scharf, Raoul Kirner, Andreas Vetter

A continuous improvement of resolution in mask-aligner lithography is sought after to meet the requirements of an ever decreasing minimum feature size in back-end processes. For periodic structures, utilizing the Talbot effect for lithography has emerged a ...

2018

Enhancement of optical quality factor by thermal annealing of single crystal diamond micro-resonators

Niels Quack, Marcell Kristof Kiss, Teodoro Graziosi, Sichen Mi

We report on the increase in optical quality factor of a suspended single crystal diamond micro-disk resonator by thermal annealing. The resonators are fabricated by Deep Reactive Ion Etching (DRIE) to obtain circular pillars in bulk single crystal diamond ...

IEEE2018

Improving the resolution in mask-aligner lithography

Wilfried Noell, Toralf Scharf, Raoul Kirner, Andreas Vetter

For the back-end microfabrication in integrated circuits and for the manufacturing of light emitting diodes, proximity mask-aligner lithography is still the tool of choice, due to its simplicity and low costs. However, the downscaling of functional element ...

IEEE2018

High-power modular LED-based illumination systems for mask-aligner lithography

Hans Peter Herzig, Toralf Scharf, Johana Bernasconi

Mask-aligner lithography is traditionally performed using mercury arc lamps with wavelengths ranging from 250 nm to 600 nm with intensity peaks at the i, g and h lines. Since mercury arc lamps present several disadvantages, it is of interest to replace the ...

2018

Single crystal diamond micro-disk resonators by focused ion beam milling

Niels Quack, Marcell Kristof Kiss, Teodoro Graziosi, Sichen Mi

We report on single crystal diamond micro-disk resonators fabricated in bulk chemical vapor deposition diamond plates (3 mm x 3 mm x 0.15 mm) using a combination of deep reactive ion etching and Focused Ion Beam (FIB) milling. The resulting structures are ...

2018