Method for deposition of a sensor on a conductive substrate

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Chemical oxidants applied in water treatment are electrophiles, which preferentially attack sites with higher electron density. This typically results in less efficient oxidative abatement of organic compounds with electronwithdrawing substituents. In this ...

Inductive magnetic sensors are needed for tokamak operation to provide the low-frequency (LF) measurements leading to the equilibrium reconstruction and to monitor the higher frequency (HF) instabilities; the HF magnetic sensors are often also used as a ba ...

Micropollutants (MP) such as residues of pharmaceuticals, industrial chemicals or pesticides can be detected in almost all water resources. Various processes can be used to abate them in drinking water treatment, e.g., ozonation, advanced oxidation process ...

The material and exact shape of a nanostructure determine its optical response, which is especially strong for plasmonic metals. Unfortunately, only a few plasmonic metals are available, which limits the spectral range where these strong optical effects ca ...

Miniaturization has been at the forefront of scientific research in the past decade covering diverse areas such as electronics, mechanics, and optics. While 'small is beautiful' may be a vast generalization, the true benefits of miniaturization are especia ...

Integrated wearable electronics capable of transducing and transmitting biophysical information on complex and dynamic systems are attracting high interest across the consumer electronics, clinical, and research domains. Gallium and gallium-based liquid me ...

New types of metamaterials and architectured material require metallic materials with precise structural design in the microscale. However, additivemanufacturing of metallic structures in themicroscale has proven difficult, as the demand for the material q ...

The fabrication of defined and high-quality metal nanostructures is an ongoing topic of research. Direct-write deposition of copper nanostructures is of great value for many fields of research and industrial applications. Focused electron beam induced depo ...

New cell-imprint surface modification techniques based on direct-cell photolithography and optical soft lithography using poly(dimethylsiloxane) (PDMS) cell imprints are presented for enhanced cell-based studies. The core concept of engineering materials f ...

The DNA Curtains assay is a recently developed experimental platform for protein-DNA interaction studies at the single-molecule level that is based on anchoring and alignment of DNA fragments. The DNA Curtains so far have been made by using chromium barrie ...

In proximity mask aligner photolithography, diffraction of light at the mask pattern is the predominant source for image shape distortions such as line end shortening and corner rounding. One established method to mitigate the impact of diffraction is opti ...

The information age we live in today relies on highly integrated devices. They are fabricated with the help of photolithography, the patterning technique at the heart of their production. With the continuous demand for higher integration density to achieve ...

We present and discuss Talbot mask-aligner lithography, relying on a continuous wave laser emitting at 193nm for the illumination. In this source, a diode laser at 772nm is amplified by a tapered amplifier in master-oscillator power-amplifier configuration ...

Thermal scanning probe lithography (t-SPL) is an advanced lithography technique in which a heated atomic force microscope tip locally modifies a sample material. Due to the nanometer-sized tip apex diameter, t-SPL enables patterning of sub-10 nm structures ...

Cellular metallic materials have emerged as a new promising class of materials due to their lightweight porous structures and advanced multi-functional properties. Originally limited to random metallic foams, modern lithography techniques have enabled the ...

A continuous improvement of resolution in mask-aligner lithography is sought after to meet the requirements of an ever decreasing minimum feature size in back-end processes. For periodic structures, utilizing the Talbot effect for lithography has emerged a ...

For the back-end microfabrication in integrated circuits and for the manufacturing of light emitting diodes, proximity mask-aligner lithography is still the tool of choice, due to its simplicity and low costs. However, the downscaling of functional element ...

Mask-aligner lithography is a technology used to transfer patterns with critical dimensions in the micrometer range from below 1 micron for contact printing to a dozen of microns in proximity printing. This technology is widely used in the fabrication of M ...

Printing industry and printing techniques are increasing its market value by new methodologies. The resolution and accuracy of the pattern transfer is always a challenge for the industry, especially for the proximity printing industries which use mask alig ...

Thermal scanning probe lithography is an emerging nanofabrication technique for rapid prototyping of arbitrary topographies in thermally sensitive resist. This feature, paired to the recent advances in dry plasma etching techniques, allows the fabrication ...

Method for deposition of a sensor on a conductive substrate

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The Mn(VII)-H2O2 oxidation process: Abatement of electron-deficient N-containing organic compounds

First developments towards producing inductive magnetic sensors using state-of-the-art photolithography techniques

Pretreatment options for micropollutant abatement before aquifer recharge in drinking water production: Assessment of UV/H2O2 and dense membranes

A Low-Temperature Annealing Method for Alloy Nanostructures and Metasurfaces: Unlocking a Novel Degree of Freedom

Femtosecond laser-based optomechanical processes for permanent and high-precision fine alignment of optical systems

Microscale Liquid Metal Conductors for Stretchable and Transparent Electronics

Template-assisted electrodeposition of nickel and nickel copper 3D microcomponents

Electron Beam Induced Copper Deposition from Carboxylate Precursors and the Study of Underlying Growth Mechanisms

Cell-Imprint Surface Modification by Contact Photolithography-Based Approaches: Direct-Cell Photolithography and Optical Soft Lithography Using PDMS Cell Imprints

Fixed DNA Molecule Arrays for High-Throughput Single DNA-Protein Interaction Studies

Computational rule-based approach for corner correction of non-Manhattan geometries in mask aligner photolithography

On Advanced Large-Field Photolithography

Mask-aligner Talbot lithography using a 193 nm CW light source

Nanoscale Lithography and Thermometry with Thermal Scanning Probes

Micro-mechanics of 3D architectured metals synthesized by electrodeposition

Printing sub-micron structures using Talbot mask-aligner lithography with a 193 nm CW laser light source

Improving the resolution in mask-aligner lithography

High power modular LED-based illumination system for lithography applications

Unified rule based correction for corners in proximity lithography mask using high resolution features

High-aspect ratio nanopatterning via combined thermal scanning probe lithography and dry etching