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Fault-Tolerant Multi-Level Logic Decoder for Nanoscale Crossbar Memory Arrays

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Publications associées (38)

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Improving the resolution in mask-aligner lithography

Toralf Scharf, Wilfried Noell, Raoul Kirner

For the back-end microfabrication in integrated circuits and for the manufacturing of light emitting diodes, proximity mask-aligner lithography is still the tool of choice, due to its simplicity and low costs. However, the downscaling of functional element ...

IEEE2018

High-aspect ratio nanopatterning via combined thermal scanning probe lithography and dry etching

Jürgen Brugger, Yuliya Lisunova

Thermal scanning probe lithography is an emerging nanofabrication technique for rapid prototyping of arbitrary topographies in thermally sensitive resist. This feature, paired to the recent advances in dry plasma etching techniques, allows the fabrication ...

Elsevier2017

Unified rule based correction for corners in proximity lithography mask using high resolution features

Hans Peter Herzig, Toralf Scharf, Krishnaparvathy Puthankovilakam

Printing industry and printing techniques are increasing its market value by new methodologies. The resolution and accuracy of the pattern transfer is always a challenge for the industry, especially for the proximity printing industries which use mask alig ...

Elsevier2017

Limitations of Proximity Lithography Printing : Simulations, Experiments, and Applications

Krishnaparvathy Puthankovilakam

Photolithography is one of the earliest technologies used to transfer patterns to a substrate. It is also known as optical lithography since it uses light to transfer the pattern. The main exposure techniques exist in the industry are projection printing, ...

EPFL2017

Top-Down Technique for Scaling toNnano in Silicon MEMS

Yusuf Leblebici, Zuhal Tasdemir

Nanoscale building blocks impart added functionalities to microelectromechanical systems (MEMS). The integration of silicon nanowires with MEMS-based sensors leading to miniaturization with improved sensitivity and higher noise immunity is one example high ...

American Vacuum Society2017

Novel manufacturing methods for optical antennas : controlling light down to the single nanometer scale

Valentin Flauraud

The resonant excitation of free electrons in metallic nanostructures enables extreme near field intensities along with a deep sub-wavelength localization of the electromagnetic energy. This has been exploited to enhance light-matter interaction down to the ...

EPFL2017

Near-Memory Address Translation

Javier Picorel Obando

Virtual memory (VM) is a crucial abstraction in modern computer systems at any scale, from handheld devices to datacenters. VM provides programmers the illusion of an always sufficiently large and linear memory, making programming easier. Although the core ...

EPFL2017

Coherence management in lithography printing systems

Hans Peter Herzig, Toralf Scharf, Johana Bernasconi

In proximity lithography, interference and diffraction effects arise when printing small features because of the proximity gap. Different techniques are used in order to control and take advantage of theses effects. In this paper, the focus is set on the M ...

Spie-Int Soc Optical Engineering2016

Lightfields behind amplitude masks: Creating phase discontinuities

Hans Peter Herzig, Toralf Scharf, Wilfried Noell, Myun Sik Kim, Krishnaparvathy Puthankovilakam

Shaping of light fields behind amplitude and phase masks the basis the lithographic structure reproduction. The aerial image or better the intensity distribution defines the resolution of the structure to be printed. Contrast is the main parameter and to a ...

Ieee2016

Panel: Looking Backwards and Forwards

Giovanni De Micheli

Ten years ago, at 90 nanometers, EDA was challenged and deemed inadequate in dealing with increasing complexity, power consumption, and sub-wavelength lithography, thus harming the progress of mobile phones. Today, at 10 nanometers, integration capacity ha ...

IEEE2016

MULTI-TASK CURRICULUM LEARNING FOR PARTIALLY LABELED DATA

Jiancheng Yang

Incomplete labels are common in multi-task learning for biomedical applications due to several practical difficulties, e.g., expensive annotation efforts by experts, limit of data collection, different sources of data. A naive approach to enable joint lear ...

IEEE2023

Review on Uric Acid Recognition by MOFs with a Future in Machine Learning

Shaswati Mandal

Uric acid (UA) is produced from purine metabolism and serves as a prevalent biomarker for multiple diseases including cancer. Hyperuricemia or hypouricemia can cause multiple dysfunctions throughout the biological processes. Consequently, there is a pressi ...

Amer Chemical Soc2023

Shaping intensity behind amplitude masks for proximity correction lithography: Design, measurement and realization

Hans Peter Herzig, Toralf Scharf, Qing Tan, David Nguyen, Krishnaparvathy Puthankovilakam

Proximity exposure techniques in lithography are getting more and more popular because of the cost of ownership advantage of mask aligners compared to projection systems. In this paper a gap between simulation and the final result, the prints will be close ...

Spie-Int Soc Optical Engineering2014

Understanding the Social Context of Eating with Multimodal Smartphone Sensing: The Role of Country Diversity

Daniel Gatica-Perez

Understanding the social context of eating is crucial for promoting healthy eating behaviors. Multimodal smartphone sensor data could provide valuable insights into eating behavior, particularly in mobile food diaries and mobile health apps. However, resea ...

Assoc Computing Machinery2023

Direct imprinting of organic-inorganic hybrid materials into high aspect ratio sub-100 nm structures

Jürgen Brugger, Victor Javier Cadarso Busto, Thomas Kiefer, Vaida Auzelyte

The challenging fabrication of sub-100-nm structures with high aspect ratio by UV-nanoimprint lithography (NIL) is addressed in this work. Thermal shrinkage is induced by cooling the structures below room temperature to avoid the issues commonly arising du ...

Springer Verlag2014

Top-Down Fabrication of Gate-All-Around Vertically-Stacked Silicon Nanowire FETs with Controllable Polarity

Giovanni De Micheli, Yusuf Leblebici, Pierre-Emmanuel Julien Marc Gaillardon, Davide Sacchetto, Jian Zhang, Michele De Marchi

Asthe currentMOSFET scaling trend is facing strong limitations, technologies exploiting novel degrees of freedom at physical and architecture level are promising candidates to enable the continuation of Moore's predictions. In this paper, we report on the ...

Institute of Electrical and Electronics Engineers2014

Multi-task Learning for Joint Re-identification, Team Affiliation, and Role Classification for Sports Visual Tracking

Vladimir Dominic K. Somers

Effective tracking and re-identification of players is essential for analyzing soccer videos. But, it is a challenging task due to the non-linear motion of players, the similarity in appearance of players from the same team, and frequent occlusions. Theref ...

Assoc Computing Machinery2023

A Theory of Finite-Width Neural Networks: Generalization, Scaling Laws, and the Loss Landscape

Berfin Simsek

Deep learning has achieved remarkable success in various challenging tasks such as generating images from natural language or engaging in lengthy conversations with humans. The success in practice stems from the ability to successfully train massive neural ...

EPFL2023