Publications de Andreea Veronica Savu

Publications associées (56)

High-Resolution Resistless Nanopatterning on Polymer and Flexible Substrates for Plasmonic Biosensing Using Stencil Masks

Jürgen Brugger, Luis Guillermo Villanueva Torrijo, Andreea Veronica Savu, Oscar Vazquez Mena

The development of nanoscale lithographic methods on polymer materials is a key requirement to improve the spatial resolution and performance of flexible devices. Here, we report the fabrication of metallic nanostructures down to 20 and 50 nm in size on po ...

American Chemical Society2012

Fabrication of complex oxide microstructures by combinatorial chemical beam vapour deposition through stencil masks

Paul Muralt, Andreea Veronica Savu, Silviu Cosmin Sandu, Giacomo Benvenuti, Estelle Wagner, Scott Harada

Chemical Beam Vapour Deposition is a gas phase deposition technique, operated under high vacuum conditions, in which evaporated chemical precursors are thermally decomposed on heated substrates to form a film. In the particular equipment used in this work, ...

Elsevier2015

Vertically-stacked gate-all-around polysilicon nanowire FETs with sub-μm gates patterned by nanostencil lithography

Giovanni De Micheli, Yusuf Leblebici, Jürgen Brugger, Andreea Veronica Savu, Davide Sacchetto, Michail Zervas, Shenqi Xie

We report on the top-down fabrication of vertically-stacked polysilicon nanowire (NW) gate-all-around (GAA) field-effect-transistors (FET) by means of Inductively Coupled Plasma (ICP) etching and nanostencil lithography. The nanostencil is used to form sub ...

Elsevier2012

Stenciled conducting bismuth nanowires

Jürgen Brugger, Luis Guillermo Villanueva Torrijo, Andreea Veronica Savu, Oscar Vazquez Mena, Katrin Sidler Arnet, Sam Neuser

Stencil lithography is used here for the fabrication of bismuth nanowires using thermal evaporation. This technique provides good electrical contact resistance by having the nanowire structure and the contact pads deposited at the same time. It has also th ...

2010

Structured ZnO-based contacts deposited by non-reactive rf magnetron sputtering on ultra-thin SiO2/Si through a stencil mask

Jürgen Brugger, Andreea Veronica Savu, Marc Antonius Friedrich van den Boogaart

In this paper, we study the localized deposition of ZnO micro and nanostructures deposited by non-reactive rf-magnetron sputtering through a stencil mask on ultra-thin (10 nm) SiO2 layers containing a single plane of silicon nanocrystals (NCs), synthetized ...

2009

Ambipolar silicon nanowire FETs with stenciled-deposited metal gate

Giovanni De Micheli, Yusuf Leblebici, Jürgen Brugger, Andreea Veronica Savu, Davide Sacchetto

We report on a fully CMOS compatible fabrication method for ambipolar silicon nanowire FinFETs. The low thermal budget processing, compatible with monolithic 3D device integration, makes use of low pressure chemical vapor deposition (LPCVD) of amorphous Si ...

Elsevier2011

Analysis of the blurring in stencil lithography

Jürgen Brugger, Luis Guillermo Villanueva Torrijo, Andreea Veronica Savu, Oscar Vazquez Mena, Katrin Sidler Arnet, Philippe Langlet

A quantitative analysis of the blurring and its dependence on the stencil-substrate gap and the deposition parameters in stencil lithography, a high resolution shadow mask technique, is presented. The blurring is manifested in two ways: first, the structur ...

2009

Direct polymer patterning by high energy reactive ion beam through stencil masks

Jürgen Brugger, Oscar Vazquez Mena, Andreea Veronica Savu

Polytetrafluoroethylene (PTFE) is a polymer with remarkable physico-chemical properties which has been used for membrane and biomedical applications [1]. This fluorpolymer is however difficult or cost- inhibiting to pattern with conventional methods with h ...

2010

Silicon nanowire AFM tips grown on released scanning probe cantilevers from stencil-deposited catalysts

Jürgen Brugger, Andreea Veronica Savu

We present a parallel, full wafer technique for deposition of catalyst on released scanning probe bodies for the growth of individual high aspect-ratio Si nanowire tips. 1-D probes are necessary for imaging high aspect-ratio nano-patterns, such as deep and ...

2010

Resistivity Measurements of Gold Wires Fabricated by Stencil Lithography on Flexible Polymer Substrates

Jürgen Brugger, Luis Guillermo Villanueva Torrijo, Andreea Veronica Savu, Oscar Vazquez Mena, Marc Antonius Friedrich van den Boogaart, Katrin Sidler Arnet

We report on the patterning and characterization of titanium–gold (Ti–Au) wire test structures on polyethylene naphthalate (PEN), polyethylene terephthalate (PET) and polyimide (PI) substrates. PEN, PET and PI are flexible polymers which can withstand stre ...

Elsevier2008

Stencil-nanopatterned back reflectors for thin-film amorphous silicon n-i-p solar cells

Christophe Ballif, Jürgen Brugger, Franz-Josef Haug, Andreea Veronica Savu, Oscar Vazquez Mena, Céline Pahud

We fabricated amorphous silicon n-i-p solar cells with two types of nanopatterned back reflectors using stencil lithography. One reflector type has a plasmonic grating that is embedded in the ZnO layer; the other one has a metallic grating patterned on top ...

Ieee2012

Sub-100 nm-scale Aluminum Nanowires by Stencil Lithography: Fabrication and Characterization

Jürgen Brugger, Luis Guillermo Villanueva Torrijo, Andreea Veronica Savu, Oscar Vazquez Mena, Marc Antonius Friedrich van den Boogaart, Katrin Sidler Arnet

We present the fabrication process and electrical characterization of sub-100 nm scale Al nanowires (NWs) fabricated by stencil lithography (SL). We use a stencil with sub- 100 nm wide nanoslits patterned by focused ion beam (FIB) milling. The stencil is a ...

2008

Robust PECVD SiC membrane made for stencil lithography

Jürgen Brugger, Andreea Veronica Savu, Oscar Vazquez Mena, Katrin Sidler Arnet, Shenqi Xie, Wei Tang

Stencil lithography (SL) is a shadow mask based technique which allows parallel, resistless, micro- and nano-patterning of material through apertures in a membrane (stencil) onto a substrate [1]. The stencils are usually made of LPCVD low-stress SiN due to ...

Microelectronic Engineering2011

Organic Thin Film Transistors on Flexible Polyimide Substrates Fabricated by Full Wafer Stencil Lithography

Mihai Adrian Ionescu, Jürgen Brugger, Andreea Veronica Savu, Katrin Sidler Arnet, Nenad Cvetkovic

This paper presents new results on miniaturized organic thin film transistors (TFT) fabricated on a spin coated polyimide (PI) film. Patterning steps, that are vital for the integrity and electrical performances of the organic TFT, were performed using res ...

Elsevier2010

SiN membranes with submicrometer hole arrays patterned by wafer-scale nanosphere lithography

Jürgen Brugger, Andreea Veronica Savu, Oscar Vazquez Mena

In this work, nanosphere lithography was integrated with standard microfabrication for the wafer-scale fabrication of silicon nitride (SiN) membranes with arrays of submicrometer holes. A monolayer of polystyrene (PS) beads with a mean diameter of 428 or 5 ...

2011

Compliant membranes improve resolution in full-wafer micro/nanostencil lithography

Jürgen Brugger, Luis Guillermo Villanueva Torrijo, Andreea Veronica Savu, Oscar Vazquez Mena, Katrin Sidler Arnet

This work reports on a considerable resolution improvement of micro/nanostencil lithography when applied on full-wafer scale by using compliant membranes to reduce gap-induced pattern blurring. Silicon nitride (SiN) membranes are mechanically decoupled fro ...

2012

Reliable and Improved Nanoscale Stencil Lithography by Membrane Stabilization, Blurring and Clogging Corrections

Jürgen Brugger, Luis Guillermo Villanueva Torrijo, Andreea Veronica Savu, Oscar Vazquez Mena, Katrin Sidler Arnet

The reliable and reproducible fabrication of nanostructures by stencil lithography faces three main challenges: the stability of the thin stencil membranes with nanoapertures, the blurring of the deposited structures, and the clogging of the nanoapertures ...

2011

Stencil-Nanopatterned Back Reflectors for Thin-Film Amorphous Silicon n-i-p Solar Cells

Christophe Ballif, Jürgen Brugger, Franz-Josef Haug, Andreea Veronica Savu, Oscar Vazquez Mena, Céline Pahud

We fabricated amorphous silicon n-i-p solar cells with two types of nanopatterned back reflectors using stencil lithography. One reflector type has a plasmonic grating that is embedded in the ZnO layer; the other one has a metallic grating patterned on top ...

Ieee-Inst Electrical Electronics Engineers Inc2013

Double-Gate Pentacene TFTs with Improved Control in Subthreshold Region

Mihai Adrian Ionescu, Jürgen Brugger, Andreea Veronica Savu, Katrin Sidler Arnet, Nenad Cvetkovic, Jyotshna Bhandari

In this work a double-gate pentacene TFT architecture is presented. The devices are fabricated on a polyimide substrate using three aligned levels of stencil lithography along with standard photolithography, which enable a soft yet well controlled device p ...

IEEE2009

In-situ actuated gap reduction and clogging-free apertures for quasi-dynamic stencil lithography

Jürgen Brugger, Andreea Veronica Savu, Shenqi Xie

We demonstrate a high-resolution implementation of quasi-dynamic stencil lithography based on the integration of a micro-hotplate on the stencil membrane. The stencil design has been tailored so that the thermally actuated membrane reduces the gap between ...

2012