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Séance de cours

Lithographie : outils et techniques

Dans cours

MICRO-621: MOOC: Micro and Nanofabrication (MEMS)

Micro- and nanofabrication can be taught to students and professionals by textbooks and ex-cathedra lectures, but the real learning comes from seeing the manufacturing steps as they happen. This MOOC will not only explain the basics of microfabrication but ...

Description

Cette séance de cours couvre les principes et les outils utilisés en lithographie pour la micro et la nanofabrication, y compris la lithographie UV, les outils d'alignement et d'exposition, l'exposition au contact et à la proximité, les longueurs d'onde d'exposition et les sources lumineuses, la lithographie de projection, les techniques d'amélioration de la résolution, les masques de déphasage et la lithographie par immersion.

Dans MOOC

Micro et nanofabrication (MEMS)

Enseignant·e·s (2)

Martinus Adela Maria Gijs

Martin A.M. Gijs received his degree in physics in 1981 from the Katholieke Universiteit Leuven, Belgium and his Ph.D. degree in physics at the same university in 1986. He joined the Philips Research Laboratories in Eindhoven, The Netherlands, in 1987. Subsequently, he has worked there on micro-and nano-fabrication processes of high critical temperature superconducting Josephson and tunnel junctions, the microfabrication of microstructures in magnetic multilayers showing the giant magnetoresistance effect, the design and realisation of miniaturised motors for hard disk applications and the design and realisation of planar transformers for miniaturised power applications. He joined EPFL in 1997. His present interests are in developing technologies for novel magnetic devices, new microfabrication technologies for microsystems fabrication in general and the development and use of microsystems technologies for microfluidic and biomedical applications in particular.

Jürgen Brugger

I am a Professor of Microengineering and co-affiliated to Materials Science. Before joining EPFL I was at the MESA Research Institute of Nanotechnology at the University of Twente in the Netherlands, at the IBM Zurich Research Laboratory, and at the Hitachi Central Research Laboratory, in Tokyo, Japan. I received a Master in Physical-Electronics and a PhD degree from Neuchâtel University, Switzerland. Research in my laboratory focuses on various aspects of MEMS and Nanotechnology. My group contributes to the field at the fundamental level as well as in technological development, as demonstrated by the start-ups that spun off from the lab. In our research, key competences are in micro/nanofabrication, additive micro-manufacturing, new materials for MEMS, increasingly for wearable and biomedical applications. Together with my students and colleagues we published over 200 peer-refereed papers and I had the pleasure to supervise over 25 PhD students. Former students and postdocs have been successful in receiving awards and starting their own scientific careers. I am honoured for the appointment in 2016 as Fellow of the IEEE “For contributions to micro and nano manufacturing technology”. In 2017 my lab was awarded an ERC AdvG in the field of advanced micro-manufacturing.

Source officielle

Concepts associés (13)

Lithographie extrême ultraviolet

vignette|La technologie EUV. vignette|Outil de lithographie EUV. La lithographie extrême ultraviolet ou lithographie EUV est un procédé de photolithographie assez semblable aux procédés de lithographie classiques actuels. Il utilise un rayonnement ultraviolet (UV) d'une longueur d'onde de l'ordre de dix à quinze nanomètres (le rayonnement EUV avoisine donc la gamme des rayons X-mous), en remplaçant les objectifs (ou masques dits « en transmission ») par une série de miroirs de précision (exemple des masques dits « en réflexion »).

Photolithographie

La photolithographie est l'ensemble des opérations permettant de transférer une image (généralement présente sur un masque) vers un substrat. Cette technique est très utilisée dans l'industrie du semi-conducteur. Les motifs de l'image ainsi transférée deviendront par la suite les différentes zones des composants électroniques (exemple : contact, drain...) ou les jonctions entre ces composants.

Nanolithography

Nanolithography (NL) is a growing field of techniques within nanotechnology dealing with the engineering (patterning e.g. etching, depositing, writing, printing etc) of nanometer-scale structures on various materials. The modern term reflects on a design of structures built in range of 10−9 to 10−6 meters, i.e. nanometer scale. Essentially, the field is a derivative of lithography, only covering very small structures. All NL methods can be categorized into four groups: photo lithography, scanning lithography, soft lithography and other miscellaneous techniques.

Nanoimprint lithography

Nanoimprint lithography (NIL) is a method of fabricating nanometer scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes. The imprint resist is typically a monomer or polymer formulation that is cured by heat or UV light during the imprinting. Adhesion between the resist and the template is controlled to allow proper release.

Masque photographique

A photomask is an opaque plate with transparent areas that allow light to shine through in a defined pattern. Photomasks are commonly used in photolithography for the production of integrated circuits (ICs or "chips") to produce a pattern on a thin wafer of material (usually silicon). Several masks are used in turn, each one reproducing a layer of the completed design, and together known as a mask set. For IC production in the 1960s and early 1970s, an opaque rubylith film laminated onto a transparent mylar sheet was used.

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Séances de cours associées (32)

Technologies de microfabrication

Explore les technologies de microfabrication, la lithographie, MEMS, les processus de salle blanche, l'amélioration de la résolution, les masques de changement de phase et la complexité de la fabrication des puces.

Lithographie: Technologies de microfabrication

Explore la lithographie dans les technologies de microfabrication, couvrant le dépôt de films minces, la résolution d'impression, le flux de processus, et les limitations imposées par diffraction.

Lithographie : Concepts généraux et fabrication de masques MOOC: Micro et nanofabrication (MEMS)

Couvre les concepts de lithographie, la fabrication de masques, la lithographie UV et les techniques émergentes.

Nanomanufacturation avancée : Lithographie et auto-assemblage

Déplacez-vous dans des techniques avancées de nanomanufacturing, y compris la lithographie et le copolymère bloc auto-assemblage pour la fabrication précise des appareils.

Micro et nanofabrication pour Optomechanics

Explore l'importance de la micro- et de la nanofabrication dans l'optomécanique, couvrant les processus clés et les défis dans la fabrication des appareils.

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Concepts associés (13)

Lithographie extrême ultraviolet

Photolithographie

Nanolithography

Nanoimprint lithography

Masque photographique

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