Publication

Conductive SU8 Photoresist for Microfabrication

Philippe Renaud, Heinrich Hofmann, Arnaud Bertsch, Sébastien Jiguet
2005
Journal Articles

Abstract

A conductive composite photoresist has been developed for the direct photopatterning of electrodes. It is based on a dispersion of silver nanoparticles in SU8, a non-conductive, negative-tone photoresist. Manufactured structures have an electrical conductivity at a low silver content of around 6 vol.-%

Official source

https://infoscience.epfl.ch/entities/publication/c1a7b04b-512d-4ca4-8950-0d0796a44e97

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Conductive SU8 Photoresist for Microfabrication

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