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Disclosed is a memristor device (1) comprising two electrodes (3), each forming or including a schottky diode (5) having a schottky barrier, wherein the schottky diodes are polarized in a back-to-back arrangement, and at least one silicon nanowire (4) connecting the two electrodes, wherein the silicon nanowire is provided with a superficial oxide layer (6). a corresponding fabrication process including an oxidation process for the si nanowire(s) is also described.