Publication

NANOSTENCIL-BASED LITHOGRAPHY FOR SILICON NANOWIRES FABRICATION

Christian Santschi
2005
Reports

Abstract

We propose a novel lithography method based on local deposition through miniature shadow-masks (nanostencils) for the fabrication of silicon based nanoelectronics devices. We demonstrate the fabrication of nanowires with a CMOS compatible stencil based lithography process. The silicon nitride (SiN) stencil is fabricated using optical lithography combined with procedures. Then 45 nm wide structures are made using focused ion beam (FIB) milling. The process results in a 110 nm wide silicon nanowire.

Official source

https://infoscience.epfl.ch/entities/publication/f5922554-f5f4-4055-9e14-e0c22e5dc7dd

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Christian Santschi
2005
Reports

Abstract

Official source

https://infoscience.epfl.ch/entities/publication/f5922554-f5f4-4055-9e14-e0c22e5dc7dd

About this result

Related concepts (32)

Semiconductor device fabrication

Semiconductor device fabrication is the process used to manufacture semiconductor devices, typically integrated circuits (ICs) such as computer processors, microcontrollers, and memory chips (such as NAND flash and DRAM) that are present in everyday electrical and electronic devices. It is a multiple-step photolithographic and physio-chemical process (with steps such as thermal oxidation, thin-film deposition, ion-implantation, etching) during which electronic circuits are gradually created on a wafer, typically made of pure single-crystal semiconducting material.

Photolithography

In integrated circuit manufacturing, photolithography or optical lithography is a general term used for techniques that use light to produce minutely patterned thin films of suitable materials over a substrate, such as a silicon wafer, to protect selected areas of it during subsequent etching, deposition, or implantation operations. Typically, ultraviolet light is used to transfer a geometric design from an optical mask to a light-sensitive chemical (photoresist) coated on the substrate.

Nanoimprint lithography

Nanoimprint lithography (NIL) is a method of fabricating nanometer scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes. The imprint resist is typically a monomer or polymer formulation that is cured by heat or UV light during the imprinting. Adhesion between the resist and the template is controlled to allow proper release.

Related publications (17)

NANOSTENCIL-BASED LITHOGRAPHY FOR SILICON NANOWIRES FABRICATION

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