Publication

Bioresorbable Frequency-Selective Magnesium Microresonators Fabricated by Ion Beam Etching

2018
Posters

Abstract

We present an innovative microfabrication process to fabricate magnesium-based bioresorbable microelectromechanical systems (MEMS) by ion beam etching. This process enables the fabrication of thin biodegradable water-soluble passive electronic components with minimal exposure to aqueous media, by a novel physical vapor deposition, photolithography and dry etching sequence. We demonstrate the design, fabrication and characterization of frequency-selective magnesium RF micro-resonators in air and in water, and compare the results to values obtained by finite element modeling (FEM). Such resonators are candidates for selectively-addressable RF power receivers for bioresorbable wireless implantable medical devices.

Official source

https://infoscience.epfl.ch/entities/publication/318e5210-6f74-456d-93b1-ad1e188c64fc

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2018
Posters

Abstract

Official source

https://infoscience.epfl.ch/entities/publication/318e5210-6f74-456d-93b1-ad1e188c64fc

About this result

Related concepts (21)

Electron-beam physical vapor deposition

Electron-beam physical vapor deposition, or EBPVD, is a form of physical vapor deposition in which a target anode is bombarded with an electron beam given off by a charged tungsten filament under high vacuum. The electron beam causes atoms from the target to transform into the gaseous phase. These atoms then precipitate into solid form, coating everything in the vacuum chamber (within line of sight) with a thin layer of the anode material.

Physical vapor deposition

Physical vapor deposition (PVD), sometimes called physical vapor transport (PVT), describes a variety of vacuum deposition methods which can be used to produce thin films and coatings on substrates including metals, ceramics, glass, and polymers. PVD is characterized by a process in which the material transitions from a condensed phase to a vapor phase and then back to a thin film condensed phase. The most common PVD processes are sputtering and evaporation.

Chemical vapor deposition

Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high-quality, and high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films. In typical CVD, the wafer (substrate) is exposed to one or more volatile precursors, which react and/or decompose on the substrate surface to produce the desired deposit. Frequently, volatile by-products are also produced, which are removed by gas flow through the reaction chamber.

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Bioresorbable Frequency-Selective Magnesium Microresonators Fabricated by Ion Beam Etching

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