Lecture

Thin-Film Processing: Deposition Techniques

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In course

MICRO-566: Large-area electronics: devices and materials

Introduction to the physical concepts involved in the description of optical and electronic transport properties of thin-film semiconductor materials found in many large-area applications (solar cells, displays, imagers, etc) and introduction to the physic ...

Description

This lecture covers thin-film processing techniques, including chemical and physical processes for deposition. It explains the advantages of chemical vapor deposition (CVD) over physical vapor deposition (PVD), and introduces growth modes in thin films. The lecture also delves into Atomic Layer Deposition (ALD) as a controlled method for thin film formation. Examples of chemical reactions used in CVD are provided, along with a case study on LP-CVD ZnO. The role of plasma in the process, plasma properties, and the initiation of a plasma discharge are discussed, along with the distinction between thermal and non-thermal plasma. The lecture concludes with an explanation of the Paschen law and the factors influencing the ignition of a plasma discharge.

Instructors (2)

Christophe Ballif

Christophe Ballif is director of the Phototovoltaics and Thin Film Electronics Laboratoryb) (PV-Lab at the institute of microengineering (IMT) in Neuchâtel (part of the EPFL since 2009). The lab focus is on the science and technology of high efficiency heterojunction crystalline cells,so-called passivating contacts for solar cells, multi-junction solar cells include novel generation Perovskite on innovative optical high speed detector and on various macroelectronics application. It also deals with energy management with a focus on integration of solar electricity into the energy system. The PV-Lab has strongly contributed to technology transfer and industrialization of novel devices and full technology with numerous companies. Christophe Ballif graduated as a physicist from the EPFL in 1994, where he also obtained in 1998 his Phd degree working on novel PV materials. He accomplished his postdoctoral research at NREL (Golden, US) on compound semiconductor solar cells (CIGS and CdTe). He worked then at the Fraunhofer ISE (Ge) on crystalline silicon photovoltaics (monocrystalline and multi-crystalline) until 2003 and then at the EMPA in Thun (CH) before becoming full professor at the University of Neuchâtel IMT in 2004, taking over the chair of Prof. A. Shah. Since 2013, C.Ballif is also the director of the new CSEM PV-Center, also located in Neuchâtel. The CSEM PV-Center is focussing more on industrialisation and technology transfer in the field of solar energy, including solar electricity management and storage. At the core of the CSEM PV-center activities lies several "pilot lines" for various kinds of solar cells manufacturing, with a focus coating technologies, wet chemistry processes for crystalline silicon, metalisation techniques for solar cells, and a platform for developing "ideal packaging solutions and polymers" for PV modules. In addition, joined facitilites between CSEM and EPFL of over 800 m2 are available for modules manufacturing, measuring and accelerated aging. CSEM PV-center has also full team dedicated to storage and energy systems and operates a joined center with BFH in Biel for research on electrochemical storage. He (co-) authored over 500 journal and technical papers, as well as several patents. He is an elected member of the SATW, member of the scientific council of the Swiss AEE, and member of the board of the EPFL Energy center. In 2016, he recieved the Becquerel prize for his contributions to the field of high efficiency photovoltaics.

Franz-Josef Haug

I studied Physics between 1990 and 1996 at the Universities of Ulm (Germany) and Waikato (New Zealand). While specializing mostly on Theoretical Physics and Quantum Theory during my studies, I turned towards Experimental Physics for a graduate work on gas-phase epitaxy of silicon. After that, I pursued a PhD program at ETH Zürich (Switzerland), studying Cu(In,Ga)Se2 solar cells. As PostDoc, I went to EMPA (Switzerland) to work on plasma processes for hard coatings of TiN and to the Jülich Research Centre in Germany to study light scattering ZnO front contacts for solar cells. In 2005 I joined the Institute of Microengineering (IMT) at the University of Neuchatel to lead a research group on thin film silicon solar cells within the PV-Lab. In 2009 the IMT was integrated into EPFL. My main research interests are optics, charge transport in semiconductors and renewable energy in general. My current work is devoted to passivating contacts for crystalline silicon solar cells, using thin silicon films as contact layers. In 2015 I was appointed Maitre d'Enseignement et Recherche (Senior Lecturer and Scientist) and member of the Faculty of STI. From 2013 to 2015 I was member of the EFPL Teachers Council (CCE) and from 2016 and 2018 I was elected into the Council of the Engineering School (CF-STI). In 2020 I was elected to become a member of CF-STI. My main objective for the legislature is to represent the role of EPFL's intermediate staff and to raise the awareness for concerns of the satellite campuses.

Official source

Ontological neighbourhood

Chemical engineering

Materials science: Thin film

Related concepts (30)

Electron-beam physical vapor deposition

Electron-beam physical vapor deposition, or EBPVD, is a form of physical vapor deposition in which a target anode is bombarded with an electron beam given off by a charged tungsten filament under high vacuum. The electron beam causes atoms from the target to transform into the gaseous phase. These atoms then precipitate into solid form, coating everything in the vacuum chamber (within line of sight) with a thin layer of the anode material.

Pulsed laser deposition

Pulsed laser deposition (PLD) is a physical vapor deposition (PVD) technique where a high-power pulsed laser beam is focused inside a vacuum chamber to strike a target of the material that is to be deposited. This material is vaporized from the target (in a plasma plume) which deposits it as a thin film on a substrate (such as a silicon wafer facing the target). This process can occur in ultra high vacuum or in the presence of a background gas, such as oxygen which is commonly used when depositing oxides to fully oxygenate the deposited films.

Vacuum deposition

Vacuum deposition , also known as vacuum coating or thin-film deposition, is a group of processes used to deposit layers of material atom-by-atom or molecule-by-molecule on a solid surface. These processes operate at pressures well below atmospheric pressure (i.e., vacuum). The deposited layers can range from a thickness of one atom up to millimeters, forming freestanding structures. Multiple layers of different materials can be used, for example to form optical coatings.

Thin-film optics

Thin-film optics is the branch of optics that deals with very thin structured layers of different materials. In order to exhibit thin-film optics, the thickness of the layers of material must be similar to the coherence length; for visible light it is most often observed between 200 and 1000 nm of thickness. Layers at this scale can have remarkable reflective properties due to light wave interference and the difference in refractive index between the layers, the air, and the substrate.

Sputter deposition

Sputter deposition is a physical vapor deposition (PVD) method of thin film deposition by the phenomenon of sputtering. This involves ejecting material from a "target" that is a source onto a "substrate" such as a silicon wafer. Resputtering is re-emission of the deposited material during the deposition process by ion or atom bombardment. Sputtered atoms ejected from the target have a wide energy distribution, typically up to tens of eV (100,000 K).

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