Lecture

Thin Films: Growth and Interfaces

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In course

MSE-304: Surfaces and interfaces

This lecture introduces the fundamental concepts for describing, characterizing, and engineering surfaces and interfaces. Students will develop both theoretical and practical understanding of how interfacial phenomena influence surface properties and techn ...

Description

This lecture covers the mechanisms of dislocation motion in crystal structures, including glide and climb motions. It also delves into the concepts of glissile and sessile interfaces, as well as the growth models for thin films in modern technology, such as molecular beam epitaxy and chemical vapor deposition. The presentation explores the morphology control of thin films and different growth models, including Frank-Van der Merwe, Volmer-Weber, and Stranski-Krastanov. The discussion extends to strained and unstrained growth, diffusion-limited aggregation, and concludes with insights into the nature of interfaces and dislocations in thin film growth.

Instructors (2)

Francesco Stellacci

Francesco Stellacci graduated in Materials Engineering at the Politecnico di Milano in 1998 with a thesis on photochromic polymers with Prof. Giuseppe Zerbi and Mariacarla Gallazzi. In 1999 he moved to the Chemistry Department of the University of Arizona for as a post-doc in the group of Joe Perry in close collaboration with the group of Seth Marder. In 2002 he moved to the Department of Materials Science and Engineering at the Massachusetts Institute of Technology as an assistant professor. He was then promoted to associate without (2006) and with tenure (2009). In 2010 he moved to the Institute of Materials at EPFL as a full Professor. He holds the Alcan EP Chair. Francesco was one of the recipients of the Technology Review TR35 "35 Innovator under 35" award in 2005, and the Popular Science Magazine "Brilliant 10" award in 2007. He has been a Packard Fellow starting 2005.

Nako Nakatsuka

Mission At the Laboratory of Chemical Nanotechnology (CHEMINA), our mission is to develop translational chemical biosensing technologies that advance human health. Working at the intersection of chemistry, engineering, and neuroscience, we seek to probe the dynamic chemical landscape of biological systems across in vitro systems, in vivo models, and human clinical samples. We develop novel biorecognition elements and innovate biosensing platforms to enable monitoring of small molecules in complex biofluids,

Official source

Related concepts (32)

Chemical vapor deposition

Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high-quality, and high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films. In typical CVD, the wafer (substrate) is exposed to one or more volatile precursors, which react and/or decompose on the substrate surface to produce the desired deposit. Frequently, volatile by-products are also produced, which are removed by gas flow through the reaction chamber.

Molecular-beam epitaxy

Molecular-beam epitaxy (MBE) is an epitaxy method for thin-film deposition of single crystals. MBE is widely used in the manufacture of semiconductor devices, including transistors, and it is considered one of the fundamental tools for the development of nanotechnologies. MBE is used to fabricate diodes and MOSFETs (MOS field-effect transistors) at microwave frequencies, and to manufacture the lasers used to read optical discs (such as CDs and DVDs). Original ideas of MBE process were first established by K.

Plasma-enhanced chemical vapor deposition

Plasma-enhanced chemical vapor deposition (PECVD) is a chemical vapor deposition process used to deposit thin films from a gas state (vapor) to a solid state on a substrate. Chemical reactions are involved in the process, which occur after creation of a plasma of the reacting gases. The plasma is generally created by radio frequency (RF) (alternating current (AC)) frequency or direct current (DC) discharge between two electrodes, the space between which is filled with the reacting gases.

User interface

In the industrial design field of human–computer interaction, a user interface (UI) is the space where interactions between humans and machines occur. The goal of this interaction is to allow effective operation and control of the machine from the human end, while the machine simultaneously feeds back information that aids the operators' decision-making process. Examples of this broad concept of user interfaces include the interactive aspects of computer operating systems, hand tools, heavy machinery operator controls and process controls.

Physical vapor deposition

Physical vapor deposition (PVD), sometimes called physical vapor transport (PVT), describes a variety of vacuum deposition methods which can be used to produce thin films and coatings on substrates including metals, ceramics, glass, and polymers. PVD is characterized by a process in which the material transitions from a condensed phase to a vapor phase and then back to a thin film condensed phase. The most common PVD processes are sputtering and evaporation.

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