Lecture

Advanced Optics: Two-Cascaded Systems

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In course

MICRO-420: Selected topics in advanced optics

This course proposes a selection of different facets of modern optics and photonics. ...

Description

This lecture covers the multiplication of M matrices and conversion into S matrix for two-cascaded systems, including free space propagation. It also discusses the response obtained as a geometric progression and provides examples of beamsplitter, perfect mirror, and single dielectric boundary. The lecture further explores propagation examples, such as transmission through a slab and quarter-wave film, as well as technology considerations like ion beam sputtering and atomic layer deposition. Additionally, it delves into off-axis propagation in layered media, explaining Fresnel coefficients and providing examples of single boundaries. The content is presented by the instructor Olivier J.F. Martin.

Instructor

Olivier Martin

Olivier J.F. Martin received the M.Sc. and Ph.D. degrees in physics in 1989 and 1994, respectively, from the Swiss Federal Institute of Technology, Lausanne (EPFL), Switzerland. In 1989, he joined IBM Zurich Research Laboratory, where he investigated thermal and optical properties of semiconductor laser diodes. Between 1994 and 1997 he was a research staff member at the Swiss Federal Institute of Technology, Zurich (ETHZ). In 1997 he received a Lecturer fellowship from the Swiss National Science Foundation (SNSF). During the period 1996-1999, he spent a year and a half in the U.S.A., as invited scientist at the University of California in San Diego (UCSD). In 2001 he received a Professorship grant from the SNSF and became Professor of Nano-Optics at the ETHZ. In 2003, he was appointed Professor of Nanophotonics and Optical Signal Processing at the Swiss Federal Institute of Technology, Lausanne (EPFL), where he is currently head of the Nanophotonics and Metrology Laboratory and Director of the Microengineering Section.

Official source

Related concepts (24)

Sputter deposition

Sputter deposition is a physical vapor deposition (PVD) method of thin film deposition by the phenomenon of sputtering. This involves ejecting material from a "target" that is a source onto a "substrate" such as a silicon wafer. Resputtering is re-emission of the deposited material during the deposition process by ion or atom bombardment. Sputtered atoms ejected from the target have a wide energy distribution, typically up to tens of eV (100,000 K).

Chemical vapor deposition

Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high-quality, and high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films. In typical CVD, the wafer (substrate) is exposed to one or more volatile precursors, which react and/or decompose on the substrate surface to produce the desired deposit. Frequently, volatile by-products are also produced, which are removed by gas flow through the reaction chamber.

Pulsed laser deposition

Pulsed laser deposition (PLD) is a physical vapor deposition (PVD) technique where a high-power pulsed laser beam is focused inside a vacuum chamber to strike a target of the material that is to be deposited. This material is vaporized from the target (in a plasma plume) which deposits it as a thin film on a substrate (such as a silicon wafer facing the target). This process can occur in ultra high vacuum or in the presence of a background gas, such as oxygen which is commonly used when depositing oxides to fully oxygenate the deposited films.

Thin film

A thin film is a layer of material ranging from fractions of a nanometer (monolayer) to several micrometers in thickness. The controlled synthesis of materials as thin films (a process referred to as deposition) is a fundamental step in many applications. A familiar example is the household mirror, which typically has a thin metal coating on the back of a sheet of glass to form a reflective interface. The process of silvering was once commonly used to produce mirrors, while more recently the metal layer is deposited using techniques such as sputtering.

Pauli matrices

In mathematical physics and mathematics, the Pauli matrices are a set of three 2 × 2 complex matrices which are Hermitian, involutory and unitary. Usually indicated by the Greek letter sigma (σ), they are occasionally denoted by tau (τ) when used in connection with isospin symmetries. These matrices are named after the physicist Wolfgang Pauli. In quantum mechanics, they occur in the Pauli equation which takes into account the interaction of the spin of a particle with an external electromagnetic field.

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