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This lecture covers the determination of film thickness using X-ray Photoelectron Spectroscopy (XPS). It explains how to calculate film thickness from XPS measurements, considering factors like electron escape depth and atomic concentrations. The lecture also delves into the principles of Auger Electron Spectroscopy (AES) and its comparison with XPS, detailing the instrumentation, spectral interpretation, quantification, and depth profiling. Additionally, it explores electron sources for AES, analytical techniques like Scanning Auger Microscopy, and the concept of Auger vs. Fluorescence transition probabilities.