Release area confinement in Contour Mode Resonators

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We present here, for the first time, a fabrication technique that allows manufacturing scallop free, non-tapered, high aspect ratio in through-silicon vias (TSVs) on silicon wafers. TSVs are among major technology players in modern high-volume manufacturin ...

We present the concept and design, and we report on the experimental performance of a broadband Variable Optical Attenuator (VOA) for integration with large-core rectangular multimode waveguides. Operation of an individual 221 mu m x 111 mu m optical waveg ...

We investigate hole-selective passivating contacts that consist of an interfacial layer of silicon oxide (SiOx) and a layer of boron-doped SiCx(p). The fabrication process of these contacts involves an annealing step at temperatures above 750 degrees C whi ...

Etching an ensemble of vacancy defects (nanopores) in single-layer graphene (SLG) to obtain a high density of nanopores with an effective size that enables high-performance gas sieving is challenging. This is because nanopore nucleation and expansion are u ...

Atomically thin (2D) nanoporous membranes are an excellent platform for a broad scope of academic research. Their thickness and intrinsic ion selectivity (demonstrated for example in molybdenum disulfide-MoS2) make them particularly attractive for single-m ...

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This work presents a systematic analysis of the transport mechanism and surface passivation of tunneling oxide (SiO2)/p-type poly-silicon (poly-Si(p)) junctions applied to p-type crystalline silicon (c-Si) solar cells by means of TCAD numerical simulations ...

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High-quality and large-scale growth of monolayer molybdenum disulfide (MoS2) has caught intensive attention because of its potential in many applications due to unique electronic properties. Here, we report the wafer-scale growth of high-quality monolayer ...

We present an aspect ratio dependent etching (ARDE) method, utilizing the Bosch dry etching process of silicon, to create the optimal silicon master microstructures for replication of polydimethylsiloxane (PDMS) microchannels that allow immobilizing C. ele ...

Release area confinement in Contour Mode Resonators

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First developments towards producing inductive magnetic sensors using state-of-the-art photolithography techniques

A new versatile hybrid MEMS technology for high sensitivity, fluid proof sensing applications

2D MoS2 Nanopores: Wafer-scale Fabrication and Monolayer Stability for Long-term Single-Molecule Sensing

Demonstrating and Unraveling a Controlled Nanometer-Scale Expansion of the Vacancy Defects in Graphene by CO2

Wafer-scale MoS2 with water-vapor assisted showerhead MOCVD

Smart Slit Assembly Employing Continuously Tunable MEMS Shutter

Optimized electrochemical breakdown etching using temporal voltage variation for formation of nanopores in a silicon membrane

The Michelangelo step: removing scalloping and tapering effects in high aspect ratio through silicon vias

Mems Shutter Based Variable Optical Attenuator Integrated With Large Core Multimode Rectangular Waveguides

Nanoscale Study of the Hole-Selective Passivating Contacts with High Thermal Budget Using C-AFM Tomography

Systematic design of millisecond gasification reactor for the incorporation of gas-sieving nanopores in single-layer graphene

Wafer-Scale Fabrication of Nanopore Devices for Single-Molecule DNA Biosensing using MoS2

Silicon Nitride Integrated Nonlinear Photonics

Real- and Q-space travelling: multi-dimensional distribution maps of crystal-lattice strain (epsilon(044)) and tilt of suspended monolithic silicon nanowire structures

Wafer-level fabrication of individual solid-state nanopores for sensing single DNAs

Dielectric Actuation Techniques at the Nanoscale: Piezoelectricity and Flexoelectricity

Numerical simulations of hole carrier selective contacts in p-type c-Si solar cells

Fabrication and Characterization of Freestanding Single Crystal Diamond and Silicon Microresonators

Wafer-scale MOCVD growth of monolayer MoS2 on sapphire and SiO2

Variable-height microfluidic channels for accurate immobilization of C. elegans worms by using a single dry etching step