Publications de Vaida Auzelyte

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Direct printing of spin-on functional films is probably the most efficient method to develop low-cost novel photonic nanodevices, such as diffraction gratings, planar waveguides, nano- lasers, and antireflective coatings. For these applications high refrac ...

A novel combination of ink-jet printing (IJP) and micro-transfer moulding (μ-TM) for high-resolution, heterogeneous material microstructuring is demonstrated. First, IJP is used to accurately fill the micro-cavities in an elastomeric mould, thus avoiding t ...

Highly inorganic sol–gel films and patterned surfaces with up to 90% of titania were obtained by hydrolysis and condensation of Titanium(IV) isopropoxide. As a consequence of titania photocatalytic effect, the further treatment of the nanoimprint patterned ...

In this paper a nano-molding process using a nature-created master is demonstrated. The eye of night moth Agotis exclamationis having 100 nm-scale structures on a curved surface is used as biomimetic master mold from which nanostructures are replicated ont ...

We present and characterize an organic–inorganic hybrid sol–gel material, phenyl-bridged polysilsesquioxane (ph-PSQ), for use as a new highresolution resist for electron beam lithography (EBL). The resist has a unique characteristic as the only positive to ...

We present in this work the fabrication of high aspect ratio nanopores in 500 nm PECVD SiC films through AAO (anodic aluminum oxide) mask. The initial AAO thin film is 180 nm thick and the diameter of nanopores is 33 ± 7 nm. We have used three plasma chemi ...

We present the fabrication of thin membranes with dense arrays of nanometer and submicrometer pore arrays by the integration of standard micromachining with three pore patterning techniques: electron beam lithography (EBL), nanosphere lithography (NSL) and ...

Vaida Auzelyte

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One-step fabrication of high refractive index inorganic nanostructures

Heterogeneous material micro-transfer by ink-jet print assisted mould filling

Highly inorganic titania based sol–gel as directly patternable resist for micro- and nano- structured surfaces

Biomimetic soft lithography on curved nanostructured surfaces

Phenyl-bridged polysilsesquioxane positive and negative resist for electron beam lithography

High aspect ratio etching of nanopores in PECVD SiC through AAO mask

Solid-state nanopore array membranes patterned by electron beam lithography, nanosphere lithography and aluminum anodization

High-density, high-aspect ratio epoxy microstructures by Direct Write Laser Patterning

Large-Area Gold/Parylene Plasmonic Nanostructures Fabricated by Direct Nanocutting