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Raffaello Sobbia

Cette personne a quitté l’EPFL

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Publications associées (6)

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Hydrogen-dominated plasma, due to silane depletion, for microcrystalline silicon deposition

Christoph Hollenstein, Alan Howling, Raffaello Sobbia

Plasma conditions for microcrystalline silicon deposition generally require a high flux of atomic hydrogen, relative to SiH alpha=0 -> 3 radicals, on the growing film. The necessary dominant partial pressure of hydrogen in the plasma is conventionally obta ...

American Vacuum Society2010

Uniformity study in large-area showerhead reactors

Laurent Fabien Hubert Sansonnens, Raffaello Sobbia

Large area plasma-enhanced chemical vapor deposition of thin films such as silicon nitride or amorphous silicon is widely used for thin film transistor fabrication in the flat panel display industry. A numerical three-dimensional model to calculate the dep ...

2005

Plasma radiation for atmospheric entry at Titan: Emission spectroscopy measurements and numerical rebuilding

Pénélope Leyland, Raffaello Sobbia

Emission spectroscopy measurements on a plasma representative of Titan atmosphere composition were obtained in the Inductively Coupled Plasma wind tunnel facility (VKI-Minitorch) at the von Karman Institute in Belgium. Temperatures ranged from 3600 to 5000 ...

Cambridge University Press2013

TC4-2-Level 1: Rebuilding of Titan Atmosphere Plasma Radiation

Pénélope Leyland, Raffaello Sobbia, Daniel Potter

Rebuilding of the experimental spectroscopy of Plasmatron and Plasma Torch data for an equivalent Titan atmosphere Chemistry ...

ESA2010

3D numerical simulation of plasma enhanced chemical vapour deposition (PPECVD) applied to large-area showerhead reactors

Laurent Fabien Hubert Sansonnens, Raffaello Sobbia

2005

Experimental Investigation of Ionizing Radiating Hypersonics Flow By Mean of a Langmuir Probe

Pénélope Leyland, Raffaello Sobbia, Sami Goekce

IOP2009