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Xavier Multone

Cette personne a quitté l’EPFL

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Publications associées (4)

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High vacuum chemical vapor deposition (HV-CVD) of alumina thin films

Xavier Multone

We analyzed along this work the feasibility to produce high quality alumina thin films by High Vacuum Chemical Vapor Deposition (HV-CVD). We study the influence of various parameters on the growth process and on the film quality, such as substrate temperat ...

EPFL2009

Combination of Electron or Laser Beam Irradiation with High Vacuum Chemical Vapor Deposition (HV-CVD) of Al2O3 for in-situ Local Structuring on Wafer Scale Substrate

Patrik Willi Hoffmann, Yury Kuzminykh, Xavier Multone

A laser or electron beam assisted deposition in HV-CVD conditions was used in order to achieve structured amorphous alumina (Al2O3) deposits. Selective deposition of Al2O3 in the irradiated regions has been demonstrated. We investigate the influence of irr ...

ECS - The Electrochemical Society2009

Er-doped Al2O3 thin films deposited by high-vacuum chemical vapor deposition (HV-CVD)

Patrik Willi Hoffmann, Xavier Multone

Erbium-doped amorphous aluminum oxide layers deposited on Si or oxidized silicon substrates are promising construction pieces for future monolytic integrated optoelectronics devices. In a novel high-vacuum chemical vapor deposition setup the alumina films ...

2008

Beam-induced etching of material on substrate involves directing gaseous compound which reacts in the presence of beam to etch the excess material which not etching the substrate

Patrik Willi Hoffmann, Tristan Bret, Xavier Multone

A method and apparatus for local beam processing using a beam activated gas to etch material are described. Compounds are disclosed that are suitable for beam-induced etching. The invention is particularly suitable for electron beam induced etching of chro ...

FEI CO (FEIF-Non-standard)2005