Mediaspace scheduled maintenance: Aug 25, 2026 07:00 - 12:00 AM. During this time, videos will be temporarily unavailable. Check status updates.

Concept

Stepper

Publications associées (23)

Spatial coherence properties of an LED-based illumination system for mask-aligner lithography

Hans Peter Herzig, Toralf Scharf, Wilfried Noell, Raoul Kirner, Johana Bernasconi

A high-power LED-based illumination system has been developed as a replacement for the mercury arc lamps used in mask-aligner lithography. LEDs are arranged in a grid array and placed in the entrance aperture of individual reflectors. Those reflectors decr ...

SPIE2019

On Advanced Large-Field Photolithography

Raoul Kirner

The information age we live in today relies on highly integrated devices. They are fabricated with the help of photolithography, the patterning technique at the heart of their production. With the continuous demand for higher integration density to achieve ...

EPFL2019

Optical-stack optimization for improved SPAD photon detection efficiency

Edoardo Charbon, Claudio Bruschini, Rolando Ferrini, Arin Can Ülkü, Ivan Michel Antolovic, Scott Anthony Lindner, Ekin Kizilkan, Frédéric Zanella

Single-photon avalanche diodes (SPADs) are direct photon-to-digital detectors that enable scalable arrays with Poisson-limited signal-to-noise ratio and picosecond timing resolution. However, SPAD detectors require a guard-ring structure to prevent lateral ...

2019

Computational rule-based approach for corner correction of non-Manhattan geometries in mask aligner photolithography

Toralf Scharf, Wilfried Noell, Chen Yan, Raoul Kirner

In proximity mask aligner photolithography, diffraction of light at the mask pattern is the predominant source for image shape distortions such as line end shortening and corner rounding. One established method to mitigate the impact of diffraction is opti ...

2019

Wafer-scale MOCVD growth of monolayer MoS2 on sapphire and SiO2

Aleksandra Radenovic, Andras Kis, Thomas La Grange, Michal Daniel Macha, Ke Liu, Yanfei Zhao, Hokwon Kim, Huanyao Cun

High-quality and large-scale growth of monolayer molybdenum disulfide (MoS2) has caught intensive attention because of its potential in many applications due to unique electronic properties. Here, we report the wafer-scale growth of high-quality monolayer ...

2019

High-power modular LED-based illumination systems for mask-aligner lithography

Hans Peter Herzig, Toralf Scharf, Johana Bernasconi

Mask-aligner lithography is traditionally performed using mercury arc lamps with wavelengths ranging from 250 nm to 600 nm with intensity peaks at the i, g and h lines. Since mercury arc lamps present several disadvantages, it is of interest to replace the ...

2018

Improving the resolution in mask-aligner lithography

Toralf Scharf, Wilfried Noell, Raoul Kirner

For the back-end microfabrication in integrated circuits and for the manufacturing of light emitting diodes, proximity mask-aligner lithography is still the tool of choice, due to its simplicity and low costs. However, the downscaling of functional element ...

IEEE2018

High power ultraviolet LED illumination systems: coherence properties and applications in photolithography

Johana Bernasconi

Mask-aligner photolithography is a technology used to replicate patterns from a mask to a photosensitive substrate. It is widely used in the fabrication of MEMS and micro-optical components, and for other applications with dimensions in the micrometer rang ...

EPFL2018

High power modular LED-based illumination system for lithography applications

Hans Peter Herzig, Toralf Scharf, Wilfried Noell, Raoul Kirner, Johana Bernasconi

Mask-aligner lithography is a technology used to transfer patterns with critical dimensions in the micrometer range from below 1 micron for contact printing to a dozen of microns in proximity printing. This technology is widely used in the fabrication of M ...

2018

Variable-height microfluidic channels for accurate immobilization of C. elegans worms by using a single dry etching step

Martinus Adela Maria Gijs, Hüseyin Baris Atakan, Rongrong Xiang

We present an aspect ratio dependent etching (ARDE) method, utilizing the Bosch dry etching process of silicon, to create the optimal silicon master microstructures for replication of polydimethylsiloxane (PDMS) microchannels that allow immobilizing C. ele ...

2018

Printing sub-micron structures using Talbot mask-aligner lithography with a 193 nm CW laser light source

Toralf Scharf, Wilfried Noell, Raoul Kirner

A continuous improvement of resolution in mask-aligner lithography is sought after to meet the requirements of an ever decreasing minimum feature size in back-end processes. For periodic structures, utilizing the Talbot effect for lithography has emerged a ...

2018

Unified rule based correction for corners in proximity lithography mask using high resolution features

Hans Peter Herzig, Toralf Scharf, Krishnaparvathy Puthankovilakam

Printing industry and printing techniques are increasing its market value by new methodologies. The resolution and accuracy of the pattern transfer is always a challenge for the industry, especially for the proximity printing industries which use mask alig ...

Elsevier2017

Compact Lensless Phase Imager

Michaël Unser, Ferréol Arnaud Marie Soulez

Lensless quantitative phase imaging is of high interest for obtaining a large field of view (FOV), typically the size of the camera chip, to observe biological cell material with high contrast. It has the potential to be widely spread due to its inherent s ...

2017

A reproducible method for μm precision alignment of PDMS microchannels with on-chip electrodes using a mask aligner

Philippe Renaud, Jonathan Bastien Cottet

This paper describes a reproducible method for μm precision alignment of polydimethylsiloxane (PDMS) microchannels with coplanar electrodes using a conventional mask aligner for lab-on-a-chip applications. It is based on the use of a silicon mold in combin ...

American Institute of Physics2017

Limitations of Proximity Lithography Printing : Simulations, Experiments, and Applications

Krishnaparvathy Puthankovilakam

Photolithography is one of the earliest technologies used to transfer patterns to a substrate. It is also known as optical lithography since it uses light to transfer the pattern. The main exposure techniques exist in the industry are projection printing, ...

EPFL2017

Top-Down Technique for Scaling toNnano in Silicon MEMS

Yusuf Leblebici, Zuhal Tasdemir

Nanoscale building blocks impart added functionalities to microelectromechanical systems (MEMS). The integration of silicon nanowires with MEMS-based sensors leading to miniaturization with improved sensitivity and higher noise immunity is one example high ...

American Vacuum Society2017

Surface 3D Micro Free Forms: Multifunctional Microstructured Mesoporous alpha-Alumina by in Situ Slip Casting Using Excimer Laser Ablated Polycarbonate Molds

Patrik Willi Hoffmann, Paul Bowen, Sriharitha Rowthu

Ceramic surface microstructuring is a rapidly growing field with a variety of applications in tribology, wetting, biology, and so on. However, there are limitations to large-area microstructuring and fabrication of three-dimensional (3D) micro free forms. ...

Amer Chemical Soc2015

Post-cmos processing and 3d integration based on dry-film lithography

Yusuf Leblebici, Carlotta Guiducci, Yüksel Temiz

A method for performing a post processing pattern on a diced chip having a foot-print, comprises the steps of providing a support wafer; applying a first dry film photoresist to the support wafer; positioning a mask corresponding to the footprint of the di ...

2015

Study of bending reliability and electrical properties of platinum lines on flexible polyimide substrates

Nico de Rooij, Danick Briand, Francisco Molina Lopez, Jérôme Courbat

We have experimentally studied the variation in electrical resistance of flexible platinum lines patterned on polyimide foil when they are subjected to circular bending constraints. The lines were patterned by means of standard photolithography and sputter ...

Elsevier2014

Shaping intensity behind amplitude masks for proximity correction lithography: Design, measurement and realization

Hans Peter Herzig, Toralf Scharf, Qing Tan, David Nguyen, Krishnaparvathy Puthankovilakam

Proximity exposure techniques in lithography are getting more and more popular because of the cost of ownership advantage of mask aligners compared to projection systems. In this paper a gap between simulation and the final result, the prints will be close ...

Spie-Int Soc Optical Engineering2014