Publication

Grayscale Patterning of Silica

2024

Abstract

Grayscale photolithography is an advanced microfabrication technique that enables the creation of complex three-dimensional structures. Unlike traditional lithography, which produces binary patterns (black or white), grayscale photolithography offers the possibility of precisely controlling the intensity of light exposure to obtain patterns with different heights or depths in a single exposure step. After exposing patterns on the photoresists, we used an ion electron beam (IBE) to etch the silica with different recipes. This enabled us to highlight the effects of plasma etching on silica, such as the etching rate and silica behavior.

Official source

https://infoscience.epfl.ch/entities/publication/e6842dd9-47b3-46ea-9e15-9844fd4fcb9c

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2024

Abstract

Official source

https://infoscience.epfl.ch/entities/publication/e6842dd9-47b3-46ea-9e15-9844fd4fcb9c

About this result

Related concepts (32)

Plasma etching

Plasma etching is a form of plasma processing used to fabricate integrated circuits. It involves a high-speed stream of glow discharge (plasma) of an appropriate gas mixture being shot (in pulses) at a sample. The plasma source, known as etch species, can be either charged (ions) or neutral (atoms and radicals). During the process, the plasma generates volatile etch products at room temperature from the chemical reactions between the elements of the material etched and the reactive species generated by the plasma.

Photolithography

In integrated circuit manufacturing, photolithography or optical lithography is a general term used for techniques that use light to produce minutely patterned thin films of suitable materials over a substrate, such as a silicon wafer, to protect selected areas of it during subsequent etching, deposition, or implantation operations. Typically, ultraviolet light is used to transfer a geometric design from an optical mask to a light-sensitive chemical (photoresist) coated on the substrate.

Etching (microfabrication)

Etching is used in microfabrication to chemically remove layers from the surface of a wafer during manufacturing. Etching is a critically important process module, and every wafer undergoes many etching steps before it is complete. For many etch steps, part of the wafer is protected from the etchant by a "masking" material which resists etching. In some cases, the masking material is a photoresist which has been patterned using photolithography. Other situations require a more durable mask, such as silicon nitride.

Related publications (2)

Grayscale Patterning of Silica

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