Publication

Low-temperature and hydrogen-free silicon dioxide cladding for integrated photonics

Tobias Kippenberg, Rui Ning Wang, Zheru Qiu, Zihan Li
2023

Abstract

We demonstrate a hydrogen-free low-loss silicon oxide film deposited with SiCl4 and O2 precursor. A very wide low-loss window of 1300 nm to 1620 nm is achieved at deposition temperature as low as 300 ◦C.

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Low-temperature and hydrogen-free silicon dioxide cladding for integrated photonics

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