Publication

A back-illuminated 3D-stacked single-photon avalanche diode in 45nm CMOS technology

Edoardo Charbon, Myung Jae Lee, Preethi Padmanabhan, Augusto Ronchini Ximenes
2018
Conference Papers

Abstract

We report on the world's first back-illuminated 3D-stacked single-photon avalanche diode (SPAD) in 45nm CMOS technology. This SPAD achieves a dark count rate of 55.4cps/μm 2 , a maximum photon detection probability of 31.8% at 600nm, over 5% in the 420-920nm wavelength range, and timing jitter of 107.7ps at 2.5V excess bias voltage and room temperature. To the best of our knowledge, these are the best results ever reported for any back-illuminated 3D-stacked SPAD technology.

Official source

https://infoscience.epfl.ch/entities/publication/a5b31d34-582c-4355-b59e-4cb4121334e7

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Edoardo Charbon, Myung Jae Lee, Preethi Padmanabhan, Augusto Ronchini Ximenes
2018
Conference Papers

Abstract

Official source

https://infoscience.epfl.ch/entities/publication/a5b31d34-582c-4355-b59e-4cb4121334e7

About this result

Related concepts (3)

CMOS

Complementary metal–oxide–semiconductor (CMOS, pronounced "sea-moss", siːmɑːs, -ɒs) is a type of metal–oxide–semiconductor field-effect transistor (MOSFET) fabrication process that uses complementary and symmetrical pairs of p-type and n-type MOSFETs for logic functions. CMOS technology is used for constructing integrated circuit (IC) chips, including microprocessors, microcontrollers, memory chips (including CMOS BIOS), and other digital logic circuits.

Semiconductor device fabrication

Semiconductor device fabrication is the process used to manufacture semiconductor devices, typically integrated circuits (ICs) such as computer processors, microcontrollers, and memory chips (such as NAND flash and DRAM) that are present in everyday electrical and electronic devices. It is a multiple-step photolithographic and physio-chemical process (with steps such as thermal oxidation, thin-film deposition, ion-implantation, etching) during which electronic circuits are gradually created on a wafer, typically made of pure single-crystal semiconducting material.

Microprocessor chronology

The first microprocessors were designed and manufactured in the 1970s. Intel's 4004 of 1971 is widely regarded as the first commercial microprocessor. Designers predominantly used MOSFET transistors with pMOS logic in the early 1970s, switching to nMOS logic after the mid-1970s. nMOS had the advantage that it could run on a single voltage, typically +5V, which simplified the power supply requirements and allowed it to be easily interfaced with the wide variety of +5V transistor-transistor logic (TTL) devices.

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