Publication

Suspended micro resonator fabrication: atomic layer deposition

2016
Student Projects

Abstract

This project is focused on atomic layer deposition of aluminium oxide to fabricate suspended microchannel resonators. Few examples of the applications of such devices are blood analysis to detect cancerous cells or device cooling directly on the chip. The main objective is to simplify the current fabrication process implemented in GR-LVT group, which is complicated and long. In autumn 2015, a previous student worked on this project, using parylene C as structural material for the microfluidic channels. The result was successful; however parylene is a very hydrophobic polymer and has bad mechanical properties. Aluminium oxide is a good alternative, as will be shown in this report. In this project, the deposition of aluminium oxide is based on ALD (atomic layer deposition) that gives very conform and uniform thin films.

Official source

https://infoscience.epfl.ch/entities/publication/a3b90409-8cd8-4f4a-998b-5470a72fdab0

About this result

This page is automatically generated and may contain information that is not correct, complete, up-to-date, or relevant to your search query. The same applies to every other page on this website. Please make sure to verify the information with EPFL's official sources.

Graph Chat

Chat with Graph Search

Ask any question about EPFL courses, lectures, exercises, research, news, etc. or try the example questions below.

DISCLAIMER: The Graph Chatbot is not programmed to provide explicit or categorical answers to your questions. Rather, it transforms your questions into API requests that are distributed across the various IT services officially administered by EPFL. Its purpose is solely to collect and recommend relevant references to content that you can explore to help you answer your questions.

2016
Student Projects

Abstract

Official source

https://infoscience.epfl.ch/entities/publication/a3b90409-8cd8-4f4a-998b-5470a72fdab0

About this result

Related concepts (32)

Chemical vapor deposition

Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high-quality, and high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films. In typical CVD, the wafer (substrate) is exposed to one or more volatile precursors, which react and/or decompose on the substrate surface to produce the desired deposit. Frequently, volatile by-products are also produced, which are removed by gas flow through the reaction chamber.

Thin film

A thin film is a layer of material ranging from fractions of a nanometer (monolayer) to several micrometers in thickness. The controlled synthesis of materials as thin films (a process referred to as deposition) is a fundamental step in many applications. A familiar example is the household mirror, which typically has a thin metal coating on the back of a sheet of glass to form a reflective interface. The process of silvering was once commonly used to produce mirrors, while more recently the metal layer is deposited using techniques such as sputtering.

Microfluidics

Microfluidics refers to a system that manipulates a small amount of fluids ((10−9 to 10−18 liters) using small channels with sizes ten to hundreds micrometres. It is a multidisciplinary field that involves molecular analysis, biodefence, molecular biology, and microelectronics. It has practical applications in the design of systems that process low volumes of fluids to achieve multiplexing, automation, and high-throughput screening.

Related publications (14)

Suspended micro resonator fabrication: atomic layer deposition

Chat with Graph Search

Growth, Characterization and Adhesion of Thick Deposited Tungsten Layers Under Transient Loading in Magnum-PSI

Direct in-situ molecular speciation of atmospheric oxidized mercury in polar regions

Development of models for assessing corroded steel girder web panels in bridges