Publication

Properties of diamond electrodes for wastewater treatment

Christos Comninellis
1999
Journal Articles

Abstract

B-doped diamond films were deposited by large-area hot filament chem. vapor deposition (HFCVD) on Si and different industrial electrode materials, such as Ti, Zr, Nb, Ta, W, and graphite, with areas up to 50 * 60 cm2. B-doping levels ranging from 50 to several thousand ppm were realized using trimethylborate. These electrodes are characterized in terms of their material and electrochem. properties by SEM, Raman spectroscopy, secondary ion mass spectrometry (SIMS), and cyclic voltammetry. Oxidn. of org. compds. in water was studied using different alcs. and org. acids. In the presence of O2, org. mols. were oxidized even at very low concns. to CO2 in the absence of large amts. of other detectable byproducts. [on SciFinder (R)]

Official source

https://infoscience.epfl.ch/entities/publication/872ae802-9583-4fd1-a9a6-9da26172b8a9

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Christos Comninellis
1999
Journal Articles

Abstract

Official source

https://infoscience.epfl.ch/entities/publication/872ae802-9583-4fd1-a9a6-9da26172b8a9

About this result

Related concepts (32)

Industrial wastewater treatment

Industrial wastewater treatment describes the processes used for treating wastewater that is produced by industries as an undesirable by-product. After treatment, the treated industrial wastewater (or effluent) may be reused or released to a sanitary sewer or to a surface water in the environment. Some industrial facilities generate wastewater that can be treated in sewage treatment plants.

Wastewater treatment

Wastewater treatment is a process which removes and eliminates contaminants from wastewater and converts this into an effluent that can be returned to the water cycle. Once returned to the water cycle, the effluent creates an acceptable impact on the environment or is reused for various purposes (called water reclamation). The treatment process takes place in a wastewater treatment plant. There are several kinds of wastewater which are treated at the appropriate type of wastewater treatment plant.

Chemical vapor deposition

Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high-quality, and high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films. In typical CVD, the wafer (substrate) is exposed to one or more volatile precursors, which react and/or decompose on the substrate surface to produce the desired deposit. Frequently, volatile by-products are also produced, which are removed by gas flow through the reaction chamber.