Publication

Reflow Of Non-Circular Nano-Pillars To Fabricate Nano-Scale Solid Immersion Lenses

2012
Conference Papers

Abstract

We investigate the reflow of non-circular, i.e., triangular and square, shaped pillars to fabricate nano-scale solid immersion lenses (SILs). Electron beam lithography (EBL) and thermal reflow are the core of the fabrication process. For the optical characterization at λ = 642 nm, nano-SILs are replicated on a transparent substrate by soft lithography. The focal spots produced by the nano-SILs show both spotsize reduction and peak-intensity enhancement, which are consistent with the immersion effect.

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2012
Conference Papers

Abstract

Official source

Related concepts (25)

Photolithography

In integrated circuit manufacturing, photolithography or optical lithography is a general term used for techniques that use light to produce minutely patterned thin films of suitable materials over a substrate, such as a silicon wafer, to protect selected areas of it during subsequent etching, deposition, or implantation operations. Typically, ultraviolet light is used to transfer a geometric design from an optical mask to a light-sensitive chemical (photoresist) coated on the substrate.

Nanoimprint lithography

Nanoimprint lithography (NIL) is a method of fabricating nanometer scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes. The imprint resist is typically a monomer or polymer formulation that is cured by heat or UV light during the imprinting. Adhesion between the resist and the template is controlled to allow proper release.

Electron-beam lithography

Electron-beam lithography (often abbreviated as e-beam lithography, EBL) is the practice of scanning a focused beam of electrons to draw custom shapes on a surface covered with an electron-sensitive film called a resist (exposing). The electron beam changes the solubility of the resist, enabling selective removal of either the exposed or non-exposed regions of the resist by immersing it in a solvent (developing). The purpose, as with photolithography, is to create very small structures in the resist that can subsequently be transferred to the substrate material, often by etching.

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Reflow Of Non-Circular Nano-Pillars To Fabricate Nano-Scale Solid Immersion Lenses

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