Publication

Near-field distribution in light-coupling masks for contact lithography

1999
Conference Papers

Abstract

We discuss the potential and limitations of Light-coupling masks for high-resolution subwavelength optical lithography. Using a three-dimensional fully vectorial numerical approach based on Green's tensor technique, the near-field distribution of the electric field in the photoresist is calculated. We study the dependence of the illuminating Light and the angle of incidence on polarization. Furthermore, we investigate the replication of structures of various sizes and separations. It is predicted that the formation of features in the 60 nm range is possible using light with a 248 nm wavelength. However, with decreasing separation among the features, crosstalk limits the ultimate resolution. (C) 1999 American Vacuum Society. [S0734-211X(99)04606-5].

Official source

https://infoscience.epfl.ch/entities/publication/75b87732-a5ef-4e91-8495-e6e8c89717cc

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1999
Conference Papers

Abstract

Official source

https://infoscience.epfl.ch/entities/publication/75b87732-a5ef-4e91-8495-e6e8c89717cc

About this result

Related concepts (26)

Nanolithography

Nanolithography (NL) is a growing field of techniques within nanotechnology dealing with the engineering (patterning e.g. etching, depositing, writing, printing etc) of nanometer-scale structures on various materials. The modern term reflects on a design of structures built in range of 10−9 to 10−6 meters, i.e. nanometer scale. Essentially, the field is a derivative of lithography, only covering very small structures. All NL methods can be categorized into four groups: photo lithography, scanning lithography, soft lithography and other miscellaneous techniques.

Electric field

An electric field (sometimes E-field) is the physical field that surrounds electrically charged particles and exerts force on all other charged particles in the field, either attracting or repelling them. It also refers to the physical field for a system of charged particles. Electric fields originate from electric charges and time-varying electric currents. Electric fields and magnetic fields are both manifestations of the electromagnetic field, one of the four fundamental interactions (also called forces) of nature.

Photolithography

In integrated circuit manufacturing, photolithography or optical lithography is a general term used for techniques that use light to produce minutely patterned thin films of suitable materials over a substrate, such as a silicon wafer, to protect selected areas of it during subsequent etching, deposition, or implantation operations. Typically, ultraviolet light is used to transfer a geometric design from an optical mask to a light-sensitive chemical (photoresist) coated on the substrate.

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Near-field distribution in light-coupling masks for contact lithography

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