Mediaspace scheduled maintenance: Aug 25, 2026 07:00 - 12:00 AM. During this time, videos will be temporarily unavailable. Check status updates.

Publication

Low-temperature plasma-deposited silicon epitaxial films: Growth and properties

Christophe Ballif, Stefaan De Wolf, Duncan Thomas Lindsay Alexander, Quentin Thomas Jeangros, Johannes Peter Seif, Bénédicte Demaurex
2014
Journal Articles

Abstract

Low-temperature (

Official source

https://infoscience.epfl.ch/entities/publication/4bbcbe61-8cee-4032-a81c-02e32ea7b030

About this result

This page is automatically generated and may contain information that is not correct, complete, up-to-date, or relevant to your search query. The same applies to every other page on this website. Please make sure to verify the information with EPFL's official sources.

Christophe Ballif, Stefaan De Wolf, Duncan Thomas Lindsay Alexander, Quentin Thomas Jeangros, Johannes Peter Seif, Bénédicte Demaurex
2014
Journal Articles

Abstract

Low-temperature (

Official source

https://infoscience.epfl.ch/entities/publication/4bbcbe61-8cee-4032-a81c-02e32ea7b030

About this result

Related concepts (23)

Crystalline silicon

Crystalline silicon or (c-Si) Is the crystalline forms of silicon, either polycrystalline silicon (poly-Si, consisting of small crystals), or monocrystalline silicon (mono-Si, a continuous crystal). Crystalline silicon is the dominant semiconducting material used in photovoltaic technology for the production of solar cells. These cells are assembled into solar panels as part of a photovoltaic system to generate solar power from sunlight. In electronics, crystalline silicon is typically the monocrystalline form of silicon, and is used for producing microchips.

Chemical vapor deposition

Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high-quality, and high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films. In typical CVD, the wafer (substrate) is exposed to one or more volatile precursors, which react and/or decompose on the substrate surface to produce the desired deposit. Frequently, volatile by-products are also produced, which are removed by gas flow through the reaction chamber.

Polycrystalline silicon

Polycrystalline silicon, or multicrystalline silicon, also called polysilicon, poly-Si, or mc-Si, is a high purity, polycrystalline form of silicon, used as a raw material by the solar photovoltaic and electronics industry. Polysilicon is produced from metallurgical grade silicon by a chemical purification process, called the Siemens process. This process involves distillation of volatile silicon compounds, and their decomposition into silicon at high temperatures. An emerging, alternative process of refinement uses a fluidized bed reactor.

Related publications (40)

Low-temperature plasma-deposited silicon epitaxial films: Growth and properties

Graph Chatbot

Large Area Monolayer Graphene Transfer in Ultra-High Vacuum

2025 roadmap on 3D nanomagnetism

2D Molybdenum Disulfide Embedded Photonic Crystal Fiber for all‐Fiber Phase Retarder