Publication

Fabrication of Heterogeneous Nanogaps for Characterizing Electrochemical Metal Deposition Processes

Nico de Rooij
2010
Posters

Abstract

We present a much simpler and high-throughput method compared to mechanically break junctions (MBJ) and electro-migration, to produce a heterogeneous nanogap, directly using electron beam lithography and metal lift-off technology. Au – Pt and Au – Pt silicide electrodes pairs are fabricated using two-step electron beam lithography. The shape of the electrode apex and the distance between the electrodes are well controlled.

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Nico de Rooij
2010
Posters

Abstract

Official source

Related concepts (23)

Photolithography

In integrated circuit manufacturing, photolithography or optical lithography is a general term used for techniques that use light to produce minutely patterned thin films of suitable materials over a substrate, such as a silicon wafer, to protect selected areas of it during subsequent etching, deposition, or implantation operations. Typically, ultraviolet light is used to transfer a geometric design from an optical mask to a light-sensitive chemical (photoresist) coated on the substrate.

Electron-beam lithography

Electron-beam lithography (often abbreviated as e-beam lithography, EBL) is the practice of scanning a focused beam of electrons to draw custom shapes on a surface covered with an electron-sensitive film called a resist (exposing). The electron beam changes the solubility of the resist, enabling selective removal of either the exposed or non-exposed regions of the resist by immersing it in a solvent (developing). The purpose, as with photolithography, is to create very small structures in the resist that can subsequently be transferred to the substrate material, often by etching.

Interference lithography

Interference lithography (or holographic lithography) is a technique for patterning regular arrays of fine features, without the use of complex optical systems or photomasks. The basic principle is the same as in interferometry or holography. An interference pattern between two or more coherent light waves is set up and recorded in a recording layer (photoresist). This interference pattern consists of a periodic series of fringes representing intensity minima and maxima.

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Fabrication of Heterogeneous Nanogaps for Characterizing Electrochemical Metal Deposition Processes

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